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On-chip spiral inductor in flip-chip technology

Published online by Cambridge University Press:  28 January 2010

Gye-An Lee*
Affiliation:
Skyworks Solutions, Inc., 5110 North River Blvd NE, Cedar Rapids, IA 52411, USA.
Darioush Agahi
Affiliation:
Skyworks Solutions, Inc., 5110 North River Blvd NE, Cedar Rapids, IA 52411, USA.
Franco De Flaviis
Affiliation:
Electrical Engineering and Computer Science, University of California, Irvine, CA 92697, USA.
*
Corresponding author: G.-A. Lee Email: gyean.lee@skyworksinc.com

Abstract

Performance comparison is made between on-chip spiral inductor in flip-chip versus wirebond package technology. Full-wave electromagnetic simulation and on-strip measurement techniques were used to study the performance fluctuations of inductor within flip-chip environment. Results show that the performance of a flipped silicon-based spiral inductor is affected by the radio frequency (RF) current return path differences. The RF current return path for flip-chip is concentrated on the surface of silicon layer exclusively because back side ground under silicon is floating in flip-chip technology. In addition, the bump proximity effect is also considered. On-chip inductors in flip-chip environment must be optimized by reducing the eddy current in the silicon substrate and parasitic affects by adjusting design parameters. The equivalent circuit model of the flipped on-chip spiral inductor is verified with measured results over broadband frequencies. Also, the RF flip-chip characterization technique using on-strip measurement method is presented.

Type
Original Article
Copyright
Copyright © Cambridge University Press and the European Microwave Association 2010

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References

REFERENCES

[1]Lee, G.-A.; Lee, H.-Y.: Suppression of the CPW leakage in common millimeter-wave flip-chip structures. IEEE Microw. Guided Wave Lett., 8 (1998), 366368.Google Scholar
[2]Niknejad, A.M.; Meyer, R.G.: Analysis, design, and optimization of spiral inductors and transformers for Si RF IC's. IEEE J. Solid-State Circuits, 33 (1998), 14701481.CrossRefGoogle Scholar
[3]Nguyen, N.M.; Meyer, R.G.: Si IC compatible inductors and LC passive filters. IEEE J. Solid-State Circuits, 25 (1990), 10281031.CrossRefGoogle Scholar
[4]Burghartz, J.N.: Progress in RF inductors on silicon – understanding substrate losses, in IEEE Int. Electron Device Meeting, 1998, pp. 523526.Google Scholar
[5]Davis, P. et al. : Silicon-on-silicon integration of a GSM transceiver with VCO resonator, in IEEE Int. Solid-State Circuits Conf., 1998, pp. 248249.Google Scholar
[6]Kim, J.; Itoh, T.: A novel microstrip to coplanar waveguide transition for flip-chip interconnection using electromagnetic coupling, in 28th European Microwave Conf. Proc., October 1998, pp. 68.CrossRefGoogle Scholar
[7]Lee, G.-A.; Megahed, M.; De Flaviis, F.: Analysis of PF flip-chip on-chip inductance with novel measurement technology, in Electronic Components and Technology Conf., May 2003, pp. 12531257.Google Scholar
[8]Koutsoyannopoulos, Y.K.; Papananos, Y.: Systematic analysis and modeling of integrated inductors and transformers in RF IC design. IEEE Trans. Circuits Systems-II: Analog Digital Signal Process., 47 (2000), 699713.CrossRefGoogle Scholar
[9]Zheng, J.; Tripathi, V.K.; Weisshaar, A.: Characterization and modeling of multiple coupled on-chip interconnects on silicon substrate. IEEE Trans. Microw. Theory Tech., 49 (2001), 17331739.CrossRefGoogle Scholar
[10]Ramo, S.; Whinnery, J.R.; Van Duzer, T.: Fields and Waves in Communication Electronics, 3rd ed., Wiley, New York, 1994, pp. 324330.Google Scholar
[11]Tegopoulos, J.A.; Kriezis, E.E.: Eddy Currents in Linear Conducting Media, Elsevier, Amsterdam, The Netherlands, 1985.Google Scholar
[12]Chun, C.; Pham, A.-V.; Laskar, J.; Hutchison, B.: Development of microwave package models utilizing on-wafer characterization techniques. IEEE Trans. Microw. Theory Tech., 45 (1997), 19481954.Google Scholar
[13]Imparato, M.; Weller, T.; Dunleavy, L.: On-wafer calibration using space-conservative (SOLT) standards, in IEEE MTT-S Int. Microwave Symp. Digest, June 1999, pp. 16431646.Google Scholar
[14]Arai, Y.; Sato, M.; Yamada, H.T.; Nagai, K.; Fujishiro, H.I.: 60-GHz flip-chip assembled MIC design considering chip-substrate effect. IEEE Trans. Microw. Theory Tech., 45 (1997), pp. 22612266.CrossRefGoogle Scholar
[15]Gonzalez, G.: Microwave Transistor Amplifiers, Prentice-Hall, Englewood Cliffs, NJ, 1997.Google Scholar
[16]Cho, H.; Burk, D.E.: A three-step method for the de-embedding of high-frequency S-parameter measurements. IEEE Trans. Electron Dev., 38 (1991), 13711375.CrossRefGoogle Scholar
[17]Pozar, D.M.; Microwave Engineering, Addison-Wesley Publishing Company, Reading, MA, 1990.Google Scholar
[18]Patrick Yue, C.; Simon Wong, S.: On-chip spiral inductors with patterned ground shields for Si-based RF IC's. IEEE J. Solid-State Circuits, 33 (1998), 743752.Google Scholar
[19]Burghartz, J.N.; Edelstein, D.C.; Soyuer, M.; Ainspan, H.A.; Jenkins, K.A.: RF circuits design aspects of spiral inductors on silicon. IEEE J. Solid-State Circuits, 33 (1998), 20282034.CrossRefGoogle Scholar