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Multigeneration solution-processed method for silver nanotriangles exhibiting narrow linewidth (∼170 nm) absorption in near-infrared

Published online by Cambridge University Press:  16 September 2019

Anmol Walia
Affiliation:
Department of Electrical Engineering, Indian Institute of Technology, New Delhi 110016, India
Sandeep Kumar
Affiliation:
Department of Electrical Engineering, Indian Institute of Technology, New Delhi 110016, India
Abhishek Ramachandran
Affiliation:
Department of Electrical Engineering, Indian Institute of Technology, New Delhi 110016, India; and Department of Physics, Indian Institute of Technology, New Delhi 110016, India
Asmita Sharma
Affiliation:
Department of Chemistry, Indian Institute of Technology, New Delhi 110016, India
Rajinder Deol
Affiliation:
Department of Electrical Engineering, Indian Institute of Technology, New Delhi 110016, India
Ghassan E. Jabbour
Affiliation:
School of Electrical Engineering and Computer Science, University of Ottawa, Ottawa K1N 6N5, Canada
Ravi Shankar
Affiliation:
Department of Chemistry, Indian Institute of Technology, New Delhi 110016, India
Madhusudan Singh*
Affiliation:
Department of Electrical Engineering, Indian Institute of Technology, New Delhi 110016, India
*
a)Address all correspondence to this author. e-mail: msingh@ee.iitd.ac.in
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Abstract

Bottom-up assembly of nanomaterials using solution-processed methods is ideally suited for use in fabrication of large-area optoelectronic devices. Tailorable visible and near-infrared absorption in shaped nanostructured noble metals is strongly influenced by localized plasmon resonance effects. Obtaining sharp and selective absorption with solution-processed methods is a challenge and requires suitable control on the growth kinetics, which ultimately results in appropriate size and morphology of the final product. In this work, a photo-assisted multigenerational growth process for synthesis of silver nanotriangle ink with narrow linewidth absorbance is developed. This technique combines photochemical and seed-mediated growth approaches. The resulting ink exhibits a sharp absorption at 700 nm with full width at half maximum of 170 nm, verified by absorption as well as dynamic light scattering, transmission electron microscopy, and field emission scanning electron microscopy measurements. Numerical modeling using finite-difference time-domain calculations yields a close match with observed absorption and is used to examine electric field distribution and enhancement factor resonating at 720 nm. The synthesis technique is potentially useable for production of highly selective absorbers in solution phase.

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Article
Copyright
Copyright © Materials Research Society 2019 

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