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On the microstructure, chemistry, and dielectric function of BaTiO3 MOCVD thin films

Published online by Cambridge University Press:  03 March 2011

V.P. Dravid ,
H. Zhang ,
L.A. Wills  and
B.W. Wessels
V.P. Dravid
Affiliation:
Department of Materials Science and Engineering, and Materials Research Center, Northwestern University, Evanston, Illinois 60208-3108
H. Zhang
Affiliation:
Department of Materials Science and Engineering, and Materials Research Center, Northwestern University, Evanston, Illinois 60208-3108
L.A. Wills
Affiliation:
Department of Materials Science and Engineering, and Materials Research Center, Northwestern University, Evanston, Illinois 60208-3108
B.W. Wessels
Affiliation:
Department of Materials Science and Engineering, and Materials Research Center, Northwestern University, Evanston, Illinois 60208-3108
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Abstract

Thin films of BaTiO3 deposited on (100)LaAlO3 substrate by metal-organic chemical vapor deposition (MOCVD) are investigated using several electron-optical techniques. Combined high resolution transmission electron microscopy (HRTEM), electron energy loss spectrometry (EELS), and convergent beam electron diffraction (CBED) indicate a substantial influence of lattice strain on the structural and optical characteristics of BaTiO3 films. Spatially resolved EELS and CBED studies indicate that the substrate influence persists up to about 40 nm away from the interface. The changes in the dielectric function of the films, as inferred from spatially resolved EELS, appear to correlate well with internal lattice strain in the films as deduced from convergent beam electron diffraction (CBED).

Type
Articles
Information
Journal of Materials Research , Volume 9 , Issue 2 , February 1994 , pp. 426 - 430
Copyright
Copyright © Materials Research Society 1994

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References

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