Hostname: page-component-76fb5796d-dfsvx Total loading time: 0 Render date: 2024-04-30T04:38:15.947Z Has data issue: false hasContentIssue false

Photovoltaics characterization: A survey of diagnostic measurements

Published online by Cambridge University Press:  31 January 2011

Lawrence L. Kazmerski
Affiliation:
Center for Measurements and Characterization, National Renewable Energy Laboratory, Golden, Colorado 80401
Get access

Abstract

The advancement of the photovoltaic technology is closely linked to the standard evaluation of the product, the diagnosis of problems, the validation of materials and cell properties, and the engineering and documentation of the ensemble of device properties from internal interfaces through power outputs. The focus of this paper is on some of the more common, visible, and important techniques dealing with physical-chemical through electro-optical parameters, which are linked intimately to the performance quality of materials and devices. Two areas, defined by their spatial-resolution qualities, are emphasized: macroscale and microscale measurement technologies. The importance, strengths, and limitations of these techniques are stressed, especially their significance to photovoltaics. Included are several techniques that have been developed specifically to address problems and requirements for photovoltaics. The regime of measurement literally covers arrays through atoms.

Type
Articles
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. See, for example, Emery, K. A. and Osterwald, C. R., in Current Topics in Photovoltaics, edited by Coutts, T. J. and Meakin, J. D. (Academic Press, New York, 1988), Vol. 3.Google Scholar
2. ANSI/IEEE Standard 928, IEEE Recommended Criteria for Terrestrial Photovoltaic Power Systems (1986).Google Scholar
3. ASTM Standard E1039, Standard Method for Calibration and Characterization of Non-Concentrator Terrestrial Photovoltaic Reference Cells under Global Irradiation.Google Scholar
4. CEC 101 Standard, Issue 2, EUR7078EN Standard Test Methods for Electrical Performance of Nonconcentrator Photovoltaic Cells Using Reference Cells, ASTM Standard E948. Also, Standard Procedures for Terrestrial Photovoltaic Measurements, Comm. of the Eur. Community (1981).Google Scholar
5. ANSI/IEEE Standard 928, IEEE Recommended Criteria for Terrestrial Photovoltaic Power Systems (1986); also, Standard Specification for Solar Simulation for Terrestrial Photovoltaic Testing, ASTM Standard E927.Google Scholar
6.Iqbal, M., An Introduction to Solar Energy (Academic Press, New York, 1983).Google Scholar
7. C82, Glossary of Terms (Photovoltaic Systems, 1987).Google Scholar
8.Standard Test Methods for Electrical Performance of Nonconcentrator Photovoltaic Cells Using Reference Cells, ASTM Standard E948.Google Scholar
9.Encyclopedia of Materials Characterization, edited by Brundle, C. R., Evans, C. A. Jr, and Wilson, S., (Butterworth, Heinemann, Boston, 1992).Google Scholar
10.Yacobi, B. G., Holt, D. B., and Kazmerski, L. L., Microanalysis of Solids (Plenum Press, New York, 1994).CrossRefGoogle Scholar
11.Ahrenkiel, R. K., in Semiconductors and Semimetals, edited by Ahrenkiel, R. K. and Lundstrom, M. S. (Academic Press, New York, 1993), Vol. 39, pp. 39150.Google Scholar
12.Orton, J. W. and Blood, P., The Electrical Characterization of Semiconductors: Measurement of Minority-Carrier Properties (Academic Press, London, 1990).Google Scholar
13.Semiconductor Characterization: Present Status and Future Needs, edited by Bullis, W. M., Seiler, D. G., and Diebold, A. C. (AIP, New York, 1996).Google Scholar
14.Kazmerski, L. L., Proc. IEEE Photovoltaic Spec. Conf. (IEEE, New York, 1993), pp. 17.Google Scholar
15.Abulfotuh, F. A. and Kazmerski, L. L., in Handbook of Thin Films (Plenum Press, New York, 1997).Google Scholar
16.Emery, K. A. and Osterwald, C. R., in Current Topics in Photovoltaics, edited by Coutts, T. J. and Meakin, J. D. (Academic Press, New York, 1988), pp. 301340.Google Scholar
17. See, for example, Wenham, S. R., Green, M. A., and Watt, M.E., Applied Photovoltaics (Centre for Photovoltaic Devices and Systems, University of New South Wales, Australia, 1994), pp. 4245.Google Scholar
18. H. Ossenbrink, R. Ban Steenwinkel, and K. Krebs, Ispra Establishment, PREPRINT EUR 10613 EN, April, 1986; also Metzdorf, J., Wittchen, T., Heidler, K., Dehne, K., Shimokawa, R., Nagamine, F., Ossenbrink, H., Fornarini, L., Goodbody, C., Davies, M., Emery, K., and DeBlasio, R., Proc. 21st IEEE Photovoltaic Spec. Conf. (IEEE, New York, 1990), pp. 952959; also, Final Report, PTB TPT PTM-Opti31, ISBN 3089429-067-6, Braunschweig, 1990, pp. 174–180.Google Scholar
19.Osterwald, C. R., Anevsky, S., Barua, A. K., Dubard, J., Emery, K., King, D., Metzdorf, J., Nagamine, F., Shimokawa, R., Udayakumar, N., Wang, Y. X., Wittchen, T., Zaaiman, W., Zastrow, Z., and Zhang, J., Proc. 25th IEEE Photovoltaic Spec. Conf. (IEEE, New York, 1996), pp. 12631266.Google Scholar
20.Emery, K. A. and Osterwald, C. R., Solar Cells 17, 253 (1986).CrossRefGoogle Scholar
21.Emery, K. A. and Osterwald, C. R., Proc. 19th IEEE Photovoltaic Spec. Conf. (IEEE, New York, 1987), pp. 153157; also, K. Heidler and J. Beir, Proc. 8th Eur. Community Photovoltaic Solar Energy Conf. (Kluwer Scientific Publ., The Netherlands, 1988).Google Scholar
22.Osterwald, C. R. and Emery, K. A., Solar Cells 10, 1 (1983); also, Terrestrial Photovoltaic Measurement Procedures, NASA Publ. TM71702 (NASA Lewis Research Center, Cleveland, OH, 1977).CrossRefGoogle Scholar
23.Emery, K. A., Solar Cells 18, 251 (1986).CrossRefGoogle Scholar
24.van der Pauw, L. J., Philips Research Reports 13, 1 (1958).Google Scholar
25.Hall, R. N., Solid State Electron. 3, 320 (1961).Google Scholar
26.Sondheimer, E. H., Phys. Rev. 80, 401 (1950).CrossRefGoogle Scholar
27.Putley, E. H., The Hall Effect and Related Phenomena (Academic Press, New York, 1975).Google Scholar
28.van der Pauw, L. J., Philips Research Reports 13, 1 (1958).Google Scholar
29.Fourier Transform Infrared Spectroscopy, edited by Ferraro, J. R. and Basile, J. (Academic Press, New York, 1985), Vols. 1–4.Google Scholar
30.Griffiths, P. R., Transform Techniques in Chemistry (Plenum Press, New York, 1978).CrossRefGoogle Scholar
31.Campion, A., Vibrational Spectroscopy of Molecules at Surfaces edited by Yates, J. T. Jr and Madey, T. M. (Plenum Press, New York, 1987).Google Scholar
32.Schrader, B., Practical Fourier Transform Infrared Spectroscopy, edited by Ferraro, J. R. and Krishnan, K. (Academic Press, New York, 1987) pp. 168203.Google Scholar
33.Ahrenkiel, R. K., in Current Topics in Photovoltaics, edited by Coutts, T. J. and Meakin, J. D. (Academic Press, London, 1988).Google Scholar
34.Ahrenkiel, R. K., Solar Cells 16, 549 (1986).CrossRefGoogle Scholar
35. See, for example, Bachrach, R. Z., Rev. Sci. Instrum. 43, 734 (1972); also, J. N. Demas, in Excited State Lifetime Measurements (Academic Press, New York, 1983) I; also, Ref. 12.CrossRefGoogle Scholar
36.Sawyer, D. and Kessler, H. K., IEEE Trans. Electron Dev. ED–27, 864 (1980); also, E. L. Miller, A. Shumka, and S. S. Chern, Proc. 15th IEEE Photovoltaic Spec. Conf. (IEEE, New York, 1981), pp. 1126–1133.CrossRefGoogle Scholar
37.Eisgruber, I. L., Matson, R. J., Sites, J. R., and Emery, K. A., Proc. IEEE Photovoltaic Spec. Conf. and World Conference on Photovoltaic Energy Conversion (IEEE, New York, 1995), pp. 283286.Google Scholar
38.Holt, D. B. and Ogden, R., Solid-State Electron. 19, 37 (1976).CrossRefGoogle Scholar
39.Matson, R. J., Emery, K. A., Eisgruber, I. L., and Kazmerski, L. L., Proc. 12th European Photovoltaic Solar Energy Conf. (Kluwer Scientific, The Netherlands, 1994), pp. 12221225.Google Scholar
40.Miller, E. L., Shumka, A., and Chern, S. S., Proc. 15th IEEE Photovoltaic Spec. Conf. (IEEE, New York, 1981), pp. 11261133.Google Scholar
41.Takakura, H., Fujimoto, K., Okuda, K., Coluzza, C., and Hamakawa, Y., Jpn. J. App. Phys. 5J, 569 (1983).CrossRefGoogle Scholar
42.Matson, R. J., Emery, K. A., Eisgruber, I. L., and Kazmerski, L. L., Proc. 12th European Photovoltaic Solar Energy Conf. (Kluwer Scientific, The Netherlands, 1994), pp. 12221225.Google Scholar
43.Ahrenkiel, R. K., in Semiconductors and Semimetals, edited by Ahrenkiel, R. K. and Lundstrom, M. S. (Academic Press, New York, 1993), Vol. 39, pp. 39150.Google Scholar
44.Schroder, D. K., in Semiconductor Material and Device Characterization (John Wiley and Sons, New York, 1990), pp. 359447.Google Scholar
45.Yablonovitch, E., Solid St. Electron. 35, 261 (1992).CrossRefGoogle Scholar
46. R. K. Ahrenkiel, B. M. Keyes, and D. J. Dunlavy, J. Appl. Phys. 70, 225 (1991). Also, Ahrenkiel, R. K., Keyes, B. M., Dunlavy, D. J., and Kazmerski, L. L., Proc. 10th EC Photovoltaic Energy Conf. (Kluwer Academic Publ., The Netherlands, 1992), pp. 533536.Google Scholar
47.Orton, J. W. and Blood, P., The Electrical Characterization of Semiconductors: Measurement of Minority-Carrier Properties (Academic Press, London, 1990).Google Scholar
48. See, for example, ASTM Annual Book of Standards, (ASTM, New York, 1985), Vol. 10.05, pp. 3955; also, ASTM Publ. F28–75 (1975).Google Scholar
49.Mattis, R. L. and Baroody, A. J., Jr., NBS Tech. Note (NBS, Gaithersburg, MD, 1972), pp. 736742.Google Scholar
50.Borrego, J. M., Gutmann, R. J., Jensen, N., and Paz, O., Solid State Electron. 30, 195 (1987).CrossRefGoogle Scholar
51.Chen, M. C., J. Appl. Phys. 64, 945 (1988).CrossRefGoogle Scholar
52.Beck, G. and Kunst, M., Rev. Sci. Instrum. 57, 197 (1986).CrossRefGoogle Scholar
53.Ahrenkiel, R. K., in Semiconductors and Semimetals, edited by Ahrenkiel, R. K. and Lundstrom, M. S. (Academic Press, New York, 1993), Vol. 39, pp. 39150.Google Scholar
54.Ahrenkiel, R. K., in Current Topics in Photovoltaics, edited by Coutts, T. J. and Meakin, J. D. (Academic Press, London, 1988).Google Scholar
55.Ahrenkiel, R. K., Keyes, B. M., and Dunlavy, D. J., J. Appl. Phys. 70, 225 (1991); R. K. Ahrenkiel, B. M. Keyes, D. J. Dunlavy, and L. L. Kazmerski, Proc. 10th EC Photovoltaic Energy Conf. (Kluwer Academic Publishers, The Netherlands, 1992), pp. 533–536.CrossRefGoogle Scholar
56.Orton, J. W. and Blood, P., The Electrical Characterization of Semiconductors: Measurement of Minority-Carrier Properties (Academic Press, London, 1990).Google Scholar
57.Bachrach, R. Z., Rev. Sci. Instrum. 43, 734 (1972); J. N. Demas, in Excited State Lifetime Measurements (Academic Press, New York, 1983).CrossRefGoogle Scholar
58.Ahrenkiel, R. K., Patent filed, June, 1997.Google Scholar
59. Miller, Lang, and Kimerling, Annual Rev. Materials Science (Annual Rev. Inc., New York, 1977), pp. 377448.Google Scholar
60.Ahrenkiel, R. K., Solar Cells 16, 549 (1986).CrossRefGoogle Scholar
61.High Resolution Transmission Electron Microscopy and Associated Techniques, edited by Buseck, P. R., Cowley, M. M., and Eyring, L. (Oxford University Press, New York, 1988).Google Scholar
62.Lang, D. V., J. Appl. Phys. 45, 3023 (1974).CrossRefGoogle Scholar
63.Brotherton, S. D. and Bradley, P., J. Appl. Phys. 53, 1543 (1982); R. Brunwin, B. Hamilton, P. Jordan, and A. R. Peaker, Electron. Lett. 15, 349 (1979).CrossRefGoogle Scholar
64.Introduction to Analytical Electron Microscopy, edited by Hren, J. J., Goldstein, J. I., and Joy, D. C. (Plenum Press, New York, 1979).CrossRefGoogle Scholar
65.Williams, D. B., Practical Analytical Electron Microscopy in Materials Science (Philips Electronic Instruments, Mahway, NJ, 1984).Google Scholar
66.Lyman, C. E., Stenger, H. G., and Michael, J. R., Ultramicroscopy 22, 129 (1987).CrossRefGoogle Scholar
67.David, V. P., Sutliff, J. A., Westwood, A. D., Notis, M. R., and Lyman, C. E., Philos. Mag. A 61, 417 (1990).CrossRefGoogle Scholar
68.Cliff, G. and Lorimer, G. W., J. Microscopy 103, 203 (1975).CrossRefGoogle Scholar
69.Mansfield, J., Convergent Beam Electron Diffraction of Alloy Phases (Hilger, Bristol, UK, 1984).Google Scholar
70.Crewe, A. V., Wall, J., and Langmore, J., Science 168, 1338 (1970).CrossRefGoogle Scholar
71.Applied Materials Characterization, edited by Katz, W. and Williams, P. (Mater. Res. Soc. Symp. Proc. 48, Pittsburgh, PA, 1985).Google Scholar
72.Williams, D. B., Practical Analytical Electron Microscopy in Materials Science (Philips Electronic Instrum., New Jersey, 1984).Google Scholar
73.Microscopic Identification of Electronic Defects in Semiconductors, edited by Johnson, N. M., Bishop, S. G., and Watkins, G. D. (Mater. Res. Soc. Symp. Proc. 46, Pittsburgh, PA, 1985); also, L. Reimer, Scanning Electron Microscopy (Springer-Verlag, Berlin, 1985).Google Scholar
74.Holt, D. B. and Joy, D. C., SEM Microcharacterization of Semiconductors (Academic Press, London, 1989).Google Scholar
75.Russ, J. C., Computer Assisted Microscopy (Plenum Press, New York, 1990).CrossRefGoogle Scholar
76.Electron Microscopy of Materials, edited by Krakow, W., Smith, D. A., and Hobbs, L. W. (Mater. Res. Soc. Symp. Proc. 31, Pittsburgh, PA, 1984).Google Scholar
77.Goldstein, J. I., Newbury, D. E., Echlin, P., Joy, D. C., Fiori, C., and Lifshin, E., Scanning Microscopy and X-Ray Microanalysis (Plenum Press, New York, 1981).Google Scholar
78.Reed, S. J. B., Electron Microprobe Analysis (Cambridge Univ. Press, London, 1975).Google Scholar
79.Holt, D. B. and Ogden, R., Solid-State Electron. 19, 37 (1976).CrossRefGoogle Scholar
80.Seiler, K., J. Appl. Phys. 54, R1 (1983).CrossRefGoogle Scholar
81.Leamy, H. J., J. Appl. Phys. 53 R51 (1982).CrossRefGoogle Scholar
82.Principles of Analytical Electron Microscopy, edited by Joy, D. C., Romig, A. D., and Goldstein, J. I. (Plenum Press, New York, 1984).Google Scholar
83.Scanning Electron Microscopy and X-ray Microanalysis, edited by Goldstein, J., Newbury, D. E., Echlin, P., Joy, D., Fiori, C., and Lifshin, E. (Plenum Press, New York, 1981), pp. 205273.CrossRefGoogle Scholar
84.Geller, J. D., Scanning Electron Microscopy/1977, edited by Johari, O. (SEM, Inc., O'Hare, IL, 1977), pp. 281288.Google Scholar
85.Introduction to Analytical Electron Microscopy, edited by Hren, J. J., Goldsteing, J. I., and Joy, D. C. (Plenum Press, New York, 1979).CrossRefGoogle Scholar
86. See, for example, Kazmerski, L. L., in Advances in Solar Energy, edited by Boer, K. (Plenum Press, New York, 1986), pp. 1123.Google Scholar
87.Russell, P. E. and Herrington, C. R., Scanning Electron Microscopy/ 1982, edited by Johari, O. (SEM, Inc., O'Hare, IL, 1982), pp. 10771082.Google Scholar
88.Kazmerski, L. L., in Advances in Solar Energy, edited by Boer, K. W. (Plenum Publ., New York, 1986), Vol. 3, pp. 58.Google Scholar
89.Leamy, H. J., J. Appl. Phys. 53, R51 (1982).CrossRefGoogle Scholar
90.Methods of Surface Analysis, edited by Czanderna, A. W. (Elsevier, New York, 1975).Google Scholar
91.McGuire, G. E., Auger Electron Spectroscopy Reference Manual (Plenum Press, New York, 1979).CrossRefGoogle Scholar
92.Handbook of X-ray Photoelectron Spectroscopy, edited by Muilenburg, G. E. (Perkin-Elmer, Eden Prairie, MN, 1979).Google Scholar
93.Electron Spectroscopy: Theory, Techniques and Applications, edited by Brundle, C. R. and Baker, A. J. (Academic Press, New York, 1979–present), Vols. 1–X.Google Scholar
94.Robinson, J. W., Handbook of Spectroscopy (CRC Press, Boca Raton, FL, 1981).Google Scholar
95.Sekine, T., Nagasawa, Y., Kudoh, M., Sakai, Y., Parkes, A. S., Geller, J. D., Mogami, A., and Hirata, K., Handbook of Auger Electron Spectroscopy (JEOL Ltd., Tokyo, 1982).Google Scholar
96.Practical Surface Analysis By Auger and X-ray Photoelectron Spectroscopy, edited by Briggs, D. and Seah, M. P. (Wiley, Chichester, 1983).Google Scholar
97.Feldman, L. C. and Mayer, J. W., Fundamentals of Surface and Thin Film Analysis (North-Holland, New York, 1986).Google Scholar
98.Thompson, M., Baker, M. D., Christie, A., and Tyson, J. F., Auger Electron Spectroscopy (Wiley-Interscience, New York, 1986).Google Scholar
99.Beninghoven, A., Rüdenauer, F. G., and Werner, H. W., Secondary Ion Mass Spectrometry (Wiley, New York, 1987).Google Scholar
100.Analytical Techniques for Thin Films, edited by Tu, K. N. and Rosenberg, R. (Academic Press, New York, 1988).Google Scholar
101.Walls, J. M., Methods of Surface Analysis (Cambridge Univ. Press, London, 1990).Google Scholar
102.Crucial Role of Surface Analysis in Studying Surfaces, edited by Czanderna, A. W. (Florida Atlantic Univ., Boca Raton, FL, 1984).Google Scholar
103.Riviere, J. C., Surface Analysis Techniques (Oxford University Press, London, 1990); also, R. G. Wilson, F. A. Stevie, and C. W. Magee, Secondary Ion Mass Spectrometry (Wiley, New York, 1989).CrossRefGoogle Scholar
104.Watts, J. F., An Introduction to Surface Analysis by Electron Spectroscopy (Oxford Univ. Press, London, 1990).Google Scholar
105.Ferguson, J. F., Auger Microprobe Analysis (Cambridge University Press, London, 1989).Google Scholar
106.Ion Spectroscopies for Surface Analysis, edited by Czanderna, A. W. and Hercules, D. M. (Plenum Press, New York, 1991); also, D. Briggs, A. Brown, and J. C. Vickerman, Handbook of Static Secondary Ion Mass Spectroscopy (Wiley, New York, 1989).CrossRefGoogle Scholar
107.Wilson, R. G., Stevie, F. A., and Magee, C. W., Secondary Ion Mass Spectrometry (Wiley, New York, 1989).Google Scholar
108.Panitz, J. K. G., Sharp, D., and Hills, C. R., J. Vac. Sci. Technol. A 3, 1 (1985). Also, G. K. Wehner, in Ref. 104. Also, R. A. Kant, S. M. Meyers, and S. T. Picraux, J. Appl. Phys. 50, 214 (1979).CrossRefGoogle Scholar
109.McHugh, J. A., in Ref. 80, pp. 223278.Google Scholar
110.Kazmerski, L. L., Burnham, N. A., Swartzlander, A. B., Nelson, A. J., and Asher, S. E., J. Vac. Sci. Technol. A 5, 2814 (1987).CrossRefGoogle Scholar
111.Stevie, F. A., Kohora, P. M., Simons, D. S., and Chi, P., J. Vac. Sci. Technol. A 6, 76 (1988).CrossRefGoogle Scholar
112.Bradley, R. M. and Harper, J. M. E., J. Vac. Sci. Technol. A 6, 2390 (1988).CrossRefGoogle Scholar
113.Wilson, R. G., Stevie, R. A., and Magee, C. W., Secondary Ion Mass Spectrometry: A Practical Handbook for Depth Profiling and Bulk Impurity Analysis (Wiley, New York, 1989).Google Scholar
114.Ion Bombardment Modification of Surfaces, edited by Auciello, O. and Kelly, R. (Elsevier, Amsterdam, 1984).Google Scholar
115.Ion Beams for Materials Analysis, edited by Bird, J. R., and Williams, J. S. (Academic Press, New York, 1988).Google Scholar
116.Zalar, A., Thin Solid Films 124, 223 (1983).CrossRefGoogle Scholar
117.Stevie, F. A., Kahora, P. M., Simons, D. S., and Chi, P., J. Vac. Sci. Technol. A 6, 76 (1988).CrossRefGoogle Scholar
118.Seah, M. P., in Methods of Surface Analysis, edited by Walls, J. M. (Cambridge Univ. Press, Cambridge, 1989); also, H. Ibach and D. L. Mills, Electron Energy Loss Spectroscopy and Surface Vibrations (Academic Press, New York, 1982); also, W. H. Weinberg, Methods of Experimental Physics 22, 23 (1985).Google Scholar
119.Gempere, J. F., Delafosse, D., and Contour, J. P., Chem. Phys. Lett. 33, 95 (1975); also, Energy Beam-Solid Interactions and Transient Thermal Processing, edited by D. K. Biegelsen, G. Rozgonyi, and C. Shank (Mater. Res. Soc. Symp. Proc. 35, Pittsburgh, PA, 1985); also, Energy Beam-Solid Interactions and Transient Thermal Processing, edited by J. C. C. Fan and N. M. Johnson (Mater. Res. Soc. Symp. 23, Pittsburgh, PA, 1984).CrossRefGoogle Scholar
120.Madden, H. H. and Ertl, G., Surf. Sci. 5, 211 (1973).CrossRefGoogle Scholar
121.Coad, J. P., Bishop, H. E., and Riviere, J. C., Surf. Sci. 21, 253 (1970).CrossRefGoogle Scholar
122.Noufi, R., Matson, R. J., Powell, R. C., and Herrington, C. R., Sol. Cells 16, 279 (1986); also, T. P. Massopust, P. J. Ireland, L. L. Kazmerski, and K. J. Bachmann, J. Vac. Sci. Technol. A 2, 1123 (1984).CrossRefGoogle Scholar
123.Finello, D. and Marcus, H. L., in Handbook of X-Ray and Photoelectron Spectroscopy, edited by Briggs, D. (Heyden and Son, London, 1977), pp. 138139.Google Scholar
124.Kazmerski, L. L., Ireland, P. J., and Sheldon, P., J. Vac. Sci. Technol. 17, 1353 (1978).Google Scholar
125.Swift, P., Shuttleworth, D., and Seah, M. P., in Ref. 110, pp. 437444.Google Scholar
126.Siegbahn, K., ESCA: Atomic, Molecular, and Solid State Structure Studied by Means of Electron Spectroscopy, Vol. 20, Series IV (Nova Acta Regime Soc. Scien., Upsala, 1967); also, ESCA Applied to Free Molecules (North-Holland, Amsterdam, 1969); also, Handbook of XPS, edited by C. D. Wagner (Perkin-Elmer, Eden Prairie, MN, 1983).Google Scholar
127.Brundle, C. R., in Molecular Spectroscopy, edited by West, A. R. (Heyden Press, London, 1976); also, Ref. 110; also, N. V. Smith and F. J. Himpsel, in Handbook on Synchrotron Radiation (North-Holland, New York, 1983), Vol. 1b.Google Scholar
128.Wagner, C. D., Riggs, W. M., Davis, L. E., Moulder, J. F., and Muilenberg, G. E., Handbook of X-ray Photoelectron Spectroscopy (Perkin-Elmer, Physical Electronics, Eden Prairie, MN, 1979); also, D. Briggs, Ref. 100, pp. 381–392.Google Scholar
129.Benninghoven, A., Ann. Phys. 15, 549 (1958); Z. Phys. 230, 402 (1970); Surf. Sci. 28, 541 (1971); also, A. Beninghoven and E. Loebach, J. Rad. Chem. 12, 95 (1972).Google Scholar
130.Briggs, D., Polymer 25, 1379 (1984); also, Handbook of Modern Ion Beam Materials Analysis, edited by J. R. Tesmer and M. Nastasi (MRS, Pittsburgh, PA, 1996).CrossRefGoogle Scholar
131.Wehner, G. K., Ref. 104, pp. 538; also, J. A. McHugh, Ref. 104, pp. 223278.Google Scholar
132.Chu, W. K., Mayer, J. W., and Nicolet, M. A., Backscattering Spectroscopy (Academic Press, New York, 1978); also, Thin Solid Films 17, 1 (1973).Google Scholar
133.Niehus, H. and Bauer, E., Surf. Sci. 47, 222 (1975); also, G. R. Sparrow, Relative Sensitivities for ISS (Adv. R&D, St. Paul, MN, 1976).CrossRefGoogle Scholar
134.Binnig, G., Rohrer, H., Gerber, Ch., and Wiebel, E., Phys. Rev. Lett. 50, 120 (1983).CrossRefGoogle Scholar
135.Scanning Tunneling Microscopy and Related Methods, edited by Behm, R. J., Garcia, N., and Rohrer, H., (Kluwer Academic Publ., Dordrecht, 1990).CrossRefGoogle Scholar
136.Atomic and Nanometer-Scale Modification of Materials: Fundamentals and Applications, edited by Avouris, Ph. (Kluwer Academic Pub., Dordrecht, 1993).CrossRefGoogle Scholar
137.Scanning Tunneling Microscopy: Theory and Practice, edited by Bonnell, D. A. (VCH Publ., New York, 1991).Google Scholar
138.Surface Analysis with STM and AFM (VCH Publ., New York, 1991).Google Scholar
139.Near Field Optics, edited by Pohl, D. W. and Courjon, D. (Kluwer Scientific Publ., The Netherlands, 1993).CrossRefGoogle Scholar
140.Handbook of Microscopy, edited by Amelinckx, S., VanDyck, D., Van Landuyt, J., and Van Tendeloo, G. (VCH Publ., New York, 1996).Google Scholar
141.Tersoff, J. and Hamann, D. R., Phys. Rev. Lett. 50, 1998 (1983).CrossRefGoogle Scholar
142.Hansma, P. K. and Tersoff, J., J. Appl. Phys. 61, 15 (1987).CrossRefGoogle Scholar
143.Whitehouse, D., Handbook of Surface Metrology (IOP Publ., Bristol, UK, 1996).Google Scholar
144.Rugar, D. and Hansma, P., Phys. Today 43, 23.CrossRefGoogle Scholar
145.Burnham, N. A. and Colton, R. J., in Ref. 166; also, J. Vac. Sci. Technol. A 7, 2906 (1989).CrossRefGoogle Scholar
146.Binnig, G., Quate, C. F., and Gerber, G., Phys. Rev. Lett. 54, 930 (1986).CrossRefGoogle Scholar
147.Burnham, N. A. and Coulton, R. J., in Scanning Tunneling Microscopy and Spectroscopy: Theory, Techniques, and Applications, edited by Bonnel, D. (VCH, New York, 1993).Google Scholar
148.Sirringhaus, H., Meyer, T., and von Kanel, H., Surf. Sci. 357/358, 386 (1996).CrossRefGoogle Scholar
149.Davies, A. and Craighead, H. G., Appl. Phys. Lett. 64, 2833 (1994).CrossRefGoogle Scholar
150. See, for example, “BEEM Takes STM Imaging Below the Surface”, Research & Development, Vol. 33, No. 9, Aug. 1, 1991, p. 63.Google Scholar
152.Prietsch, M.,Phys. Rep. 253, 9 (1995).CrossRefGoogle Scholar
152.Hecht, M. H., Bell, L. D., and Kaiser, W. J., Appl. Phys. Lett. 55, 780 (1989).CrossRefGoogle Scholar
153.Rehrer, H., in NATO Science Forum '90 (Plenum Press, New York, 1991).Google Scholar
154.Williams, R. W., personal communication.Google Scholar
155.Scanning Tunneling Microscopy and Related Methods, edited by Behm, R., Garcia, N., and Rohrer, H. (Kluwer Acad. Publ., The Netherlands, 1990).CrossRefGoogle Scholar
156.Characterization of Materials, edited by Lifshin, E. (VCH Publ., New York, 1992).Google Scholar
157.DiNardo, N. J., Nanoscale Characterization of Surfaces and Interfaces (VCH Publ., New York, 1994).CrossRefGoogle Scholar
158.Magonov, S. N. and Whangbo, M. H., Surface Analysis with STM and AFM (VCH Publ., New York, 1996).Google Scholar
159.Kazmerski, L. L., J. Vac. Sci. Technol. B 9, 1549 (1991).CrossRefGoogle Scholar
160.Scanned Probe Microscopy, edited by Wickramasinghe, H. K. (AIP, New York, 1992).Google Scholar
161.Kazmerski, L. L.,Vacuum 43, 1011 (1992).CrossRefGoogle Scholar
162.Atom Probe Microanalysis: Principles and Applications to Materials Problems, edited by Miller, M. K. and Smith, G. D. W. (Mater. Res. Soc. Symp. Proc. APM, Pittsburgh, PA, 1989).Google Scholar
163.Hansma, P. K., Tunneling Spectroscopy (Plenum Publ., New York, 1982).CrossRefGoogle Scholar
164.Harris, T. D., Grober, R. D., Trautman, J. K., and Betzig, E., Appl. Spectros. 48, 14A (1994).CrossRefGoogle Scholar
165.Courjon, C. and Bainier, C., Rep. Prog. Phys. 57, 989 (1994).CrossRefGoogle Scholar
166.Grober, R. D., Harris, T. D., Trautman, J. K., and Betzig, E., Rev. Sci. Instrum. 65, 626 (1994).CrossRefGoogle Scholar
167.Be, L. D. and Kaiser, W. J., Phys. Rev. Lett. 61, 2368 (1988).Google Scholar
168.Kazmerski, L. L., Proc. European Photovoltaic Solar Energy Conference, Amsterdam (Kluwer Publ., The Netherlands, 1994).Google Scholar