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Published online by Cambridge University Press: 10 December 2012
An argon plasma is created from a general capacitively coupled plasma source and monitored by optical emission spectroscopy. A relation between the line intensity and the applied voltage is obtained and discussed. The plasma shows paraelectric behavior. A linear relation exists between the electric capacity of the capacitively coupled plasma and the applied voltage. This linear relation can be used in a new voltage measurement technique in which the applied voltage can be calculated from the measured line intensity.