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Status and development of high-power laser facilities at the NLHPLP

Published online by Cambridge University Press:  16 November 2018

Jianqiang Zhu*
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Jian Zhu
Affiliation:
Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China Shanghai Institute of Laser Plasma, Chinese Academy of Engineering and Physics, Shanghai 201800, China
Xuechun Li
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Baoqiang Zhu
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Weixin Ma
Affiliation:
Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China Shanghai Institute of Laser Plasma, Chinese Academy of Engineering and Physics, Shanghai 201800, China
Xingqiang Lu
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Wei Fan
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Zhigang Liu
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Shenlei Zhou
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Guang Xu
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Guowen Zhang
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Xinglong Xie
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Lin Yang
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Jiangfeng Wang
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Xiaoping Ouyang
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Li Wang
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Dawei Li
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Pengqian Yang
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Quantang Fan
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Mingying Sun
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Chong Liu
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Dean Liu
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Yanli Zhang*
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Hua Tao
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Meizhi Sun
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Ping Zhu
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Bingyan Wang
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Zhaoyang Jiao
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Lei Ren
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Daizhong Liu
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Xiang Jiao
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Hongbiao Huang
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Zunqi Lin
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai 201800, China Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
*
Correspondence to:  J. Zhu and Y. Zhang, No. 390, Qinghe Road, Jiading District, Shanghai 201800, China. Email: jqzhu@siom.ac.cn (J. Zhu);zhangyl@siom.ac.cn (Y. Zhang).
Correspondence to:  J. Zhu and Y. Zhang, No. 390, Qinghe Road, Jiading District, Shanghai 201800, China. Email: jqzhu@siom.ac.cn (J. Zhu);zhangyl@siom.ac.cn (Y. Zhang).

Abstract

In this paper, we review the status of the multifunctional experimental platform at the National Laboratory of High Power Laser and Physics (NLHPLP). The platform, including the SG-II laser facility, SG-II 9th beam, SG-II upgrade (SG-II UP) facility, and SG-II 5 PW facility, is operational and available for interested scientists studying inertial confinement fusion (ICF) and a broad range of high-energy-density physics. These facilities can provide important experimental capabilities by combining different pulse widths of nanosecond, picosecond, and femtosecond scales. In addition, the SG-II UP facility, consisting of a single petawatt system and an eight-beam nanosecond system, is introduced including several laser technologies that have been developed to ensure the performance of the facility. Recent developments of the SG-II 5 PW facility are also presented.

Information

Type
Research Article
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted re-use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright
© The Author(s) 2018
Figure 0

Figure 1. Photographs of a series of laser facilities built at the NLHPLP.

Figure 1

Figure 2. Schematic view of the layout of the multifunctional platform.

Figure 2

Table 1. Output capability and feature of the present facilities.

Figure 3

Figure 3. Operational shots of SG-II facility for physical experiments.

Figure 4

Figure 4. Operational shots of SG-II UP facility for physical experiments.

Figure 5

Figure 5. Photographs of the SG-II UP facility: (a) laser hall and (b) target chamber.

Figure 6

Figure 6. Schematic of the optical layout of one beamline.

Figure 7

Figure 7. Near-field fluence distributions of the $1\unicode[STIX]{x1D714}$ output (shot No. 20150721002): (a) near-field images and (b) fluence probability distribution.

Figure 8

Figure 8. Far-field fluence distributions of the $1\unicode[STIX]{x1D714}$ output (shot No. 20150721002): (a) enclosed focal spot energy fraction and (b) far-field image.

Figure 9

Figure 9. Experimental output capability for $1\unicode[STIX]{x1D714}$ with different pulse widths of the laser prototype.

Figure 10

Figure 10. Experimental output capability of $3\unicode[STIX]{x1D714}$ with different pulse widths.

Figure 11

Figure 11. Near and far fields of the $3\unicode[STIX]{x1D714}$ output measured by PDS: (a) near-field image, (b) far-field image, and (c) enclosed $3\unicode[STIX]{x1D714}$ focal spot energy fraction.

Figure 12

Figure 12. $3\unicode[STIX]{x1D714}$ output energy per beam for four consecutive shots.

Figure 13

Figure 13. $3\unicode[STIX]{x1D714}$ output power imbalance for eight beams (shot 4).

Figure 14

Figure 14. Pulse shape in the (a) front end and (b) end of the main amplifier.

Figure 15

Figure 15. Interface of Laser Designer and the comparison of the experimental and simulation results.

Figure 16

Figure 16. (a) Regenerative amplifier, (b) output near-field profile, (c) energy stability of the regenerative amplifier for 8 h, and (d) square-pulse distortion of the regenerative amplifier.

Figure 17

Figure 17. (a) Physical photograph of the optically addressed liquid crystal spatial light modulator and (b) demonstration of near-field spatial intensity control.

Figure 18

Figure 18. Main amplifier of the SG-II UP ns laser facility.

Figure 19

Figure 19. (a) CSF alignment package and (b) resultant image.

Figure 20

Figure 20. TSF alignment package (top) and result images (bottom): (a) crystals, (b) TSF pass-1 pinhole, and (c) TSF pass-2 pinhole.

Figure 21

Figure 21. Basic scheme for single-shot beam diagnostics in high-power laser systems with the CMI method.

Figure 22

Figure 22. Comparison of the near-field intensity and phase: (a) near-field intensity reconstructed by the CMI method, (b) near-field intensity measured by direct imaging, (c) near-field phase reconstructed by the CMI method, and (d) near-field phase measured by a Shack–Hartmann wavefront sensor.

Figure 23

Figure 23. Comparison of the far-field intensity: (a) far-field intensity reconstructed by the CMI method, (b) far-field intensity measured by direct imaging, (c) encircled energy of the far-field focal spots in panel (a), and (d) encircled energy of the far-field focal spot in panel (b).

Figure 24

Figure 24. Stray light management by ground glass protection in the FOA.

Figure 25

Figure 25. Results of the surface quality of KDP crystal: (a) wavefront distribution after low-pass filter (spatial period ${>}$ 3.3 cm), (b) wavefront distribution after band passed filter (spatial period 2.5 mm–33 mm), (c) surface roughness data measured by surface profiler.

Figure 26

Figure 26. Schematic diagram of the SG-II UP picosecond laser system.

Figure 27

Figure 27. Photograph of large-aperture gratings.

Figure 28

Figure 28. Far field of picosecond laser system.

Figure 29

Figure 29. Pulse contrast measurement result of picosecond laser system[50].

Figure 30

Figure 30. (a) Photograph of the OPCPA and (b) output energy and stability data of the OPCPA.

Figure 31

Figure 31. Comparison of the spectral results before and after shaping: (a) front-end output and (b) main amplifier output.

Figure 32

Figure 32. (a) Exterior of the compression chamber and (b) layout of the pulse compressor (plan view); G1, G2, G3, and G4 are the tiled MLD gratings and M1 and M2 are the mirrors; the light passes through G1, G2, G3, and G4 sequentially (arrow direction).

Figure 33

Figure 33. Picosecond laser damage of gratings. (a) Typical morphology of pinpoint damages on the grating and (b) linear damage area growth with shot number.

Figure 34

Figure 34. Deformable mirror of the AO setup for the petawatt picosecond laser chain.

Figure 35

Figure 35. Laser auxiliary alignment system. CCRS-NW: northwest chamber center reference system; CCRS-NE: northeast chamber center reference system; TAS: target alignment sensor; TPS: target positioning system; OAPM: off-axis parabola mirror[83].

Figure 36

Figure 36. Schematic diagram of the pulse contrast measurement. $\text{M}_{\text{X}1}$, $\text{M}_{\text{X}2}$, $\text{M}_{\text{X}3}$, and $\text{M}_{\text{X}4}$ are mirrors; $\text{P}_{1}$, $\text{P}_{2}$, and $\text{P}_{3}$ are removable parallel plates; $\text{L}_{1}$, $\text{L}_{2}$, and $\text{L}_{3}$ are cylindrical lenses; $\text{A}_{1}$, $\text{A}_{2}$, and $\text{A}_{3}$ are attenuators; SHGC is the autocorrelation generation crystal; XCGC is the cross-correlation generation crystal; and PMT is the photomultiplier tube.

Figure 37

Figure 37. Schematic diagram of the SG-II 5 PW laser facility; OAPM: off-axis parabolic mirror, FM: frequency modulator, and AWG: arbitrary waveform generator.

Figure 38

Figure 38. Compressed pulse duration with the whole beam diameter.

Figure 39

Figure 39. (a) Measured focal spot imaged by the CCD after AO correction without optical parametric amplification, (b) horizontal and vertical line-outs of focal spot image, and (c) focal spot imaged by an X-ray pinhole camera in the high-energy experiments.

Figure 40

Figure 40. Spectrum of the first OPCPA stage.

Figure 41

Figure 41. Energy and stability of signal pulses from the first OPCPA stage.