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Off-axis aberration-based B-integral measurement method for a high-power laser facility

Published online by Cambridge University Press:  29 June 2026

Ziming Sun
Affiliation:
Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China University of Chinese Academy of Sciences, Beijing, China
Ailin Guo*
Affiliation:
Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China
Wei Fan
Affiliation:
Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China
Dajie Huang
Affiliation:
Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China
Wenfeng Liu
Affiliation:
Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China
Zhixiang Zhang
Affiliation:
Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China
Mingying Sun
Affiliation:
Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China
Lin Yang
Affiliation:
Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China
Chong Liu
Affiliation:
Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China
*
Correspondence to: A. Guo, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China. Email: ailinguo@siom.ac.cn

Abstract

We propose a spatially resolved B-integral measurement method for high-power laser drivers based on off-axis aberration characterization. Theoretical analysis confirms the feasibility and high precision of this approach, in which coma-shaped intensity modulation is intentionally introduced into the laser system, imprinting nonlinear phase modulation with a corresponding aberration profile. The B-integral is then extracted by measuring the coma component of the output beam using a Shack–Hartmann sensor. The experimental results demonstrate a 5.8% deviation between the measured and simulated B-integral values for coma aberration, showing that the proposed method significantly outperforms the defocus-based measurement method (67.4% error) in terms of error reduction. This method does not require modifications to the laser setup, offers a single-shot measurement capability and achieves high accuracy and excellent repeatability. The direct quantification of wavefront phase distortions provides a practical solution for nonlinear phase modulation diagnostics in high-power laser systems.

Information

Type
Research Article
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (https://creativecommons.org/licenses/by/4.0), which permits unrestricted re-use, distribution and reproduction, provided the original article is properly cited.
Copyright
© The Author(s), 2026. Published by Cambridge University Press in association with Chinese Laser Press
Figure 0

Figure 1 Aberration analysis of the SG II-Up facility: (a) near-field phase distribution; (b) defocus component; (c) astigmatism component; (d) coma component.

Figure 1

Figure 2 Distribution of Zernike coefficients for SG II-Up facility aberrations.

Figure 2

Figure 3 Optical path for feasibility verification of spatial phase distribution analysis based on defocus and coma aberration.

Figure 3

Figure 4 Cross-correlation coefficients among Zernike polynomials 1–26, sampled on a 30 × 30 grid.

Figure 4

Figure 5 Defocus aberration characterization using a phase-modulated LC-SLM: (a) LC-SLM loaded with gray level 10 defocus aberration pattern; (b) wavefront sensor measurement of maximum modulation defocus aberration (PV = 5.98 rad); (c) LC-SLM loaded with gray level 1 defocus aberration pattern; (d) wavefront sensor measurement of minimum modulation defocus aberration (PV = 0.56 rad).

Figure 5

Figure 6 Coma aberration characterization using a phase-modulated LC-SLM: (a) LC-SLM loaded with gray level 10 coma aberration pattern; (b) wavefront sensor measurement of maximum modulation coma aberration (PV = 6.02 rad); (c) LC-SLM loaded with gray level 1 coma aberration pattern; (d) wavefront sensor measurement of minimum modulation coma aberration (PV = 0.59 rad).

Figure 6

Figure 7 Optical layout of the test laser system for verifying the B-integral test method.

Figure 7

Table 1 Simulated energy flow distribution and B-integral calculation of the laser system (at 30 J output).

Figure 8

Table 2 Experimental shot parameters.

Figure 9

Figure 8 Distribution of Zernike coefficients for the test system aberrations.

Figure 10

Figure 9 Measurement setup.

Figure 11

Figure 10 Intensity modulation patterns: (a) coma-obscuration pattern; (b) inverse-Gaussian-obscuration pattern.

Figure 12

Figure 11 Near-field beam characterization with coma modulation: (a) unmodulated beam profile; (b) near-field intensity distribution after coma modulation; (c) normalized ratio of (a) and (b); (d) comparison between measured and simulated intensity profiles of the modulated beam.

Figure 13

Figure 12 Near-field beam analysis with inverse Gaussian modulation: (a) unmodulated beam profile; (b) near-field intensity after inverse-Gaussian modulation; (c) normalized ratio of (a) and (b); (d) comparison between measured and simulated intensity profiles of the modulated beam.

Figure 14

Figure 13 Temporal waveform of the laser system.

Figure 15

Figure 14 Beam characterization under coma modulation: (a) raw wavefront distribution before background subtraction; (b) background-subtracted wavefront; (c) extracted coma component from (b); (d) far-field focal spot after the 500 mm lens (DL, diffraction limit).

Figure 16

Figure 15 Beam characterization under inverse Gaussian modulation: (a) raw wavefront before background subtraction; (b) background-subtracted wavefront; (c) defocus component extracted from (b); (d) far-field focal spot through the 500 mm lens (DL, diffraction limit).

Figure 17

Figure 16 Intensity-phase relationship under (a) coma modulation and (b) inverse Gaussian modulation.