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Accepted manuscript

A Phase-Matching Design Framework for Co-optimization of Diffraction Efficiency and Electric Field in Multilayer Dielectric Gratings for High-Power Applications

Published online by Cambridge University Press:  11 June 2026

Yuxing Jiang Open the ORCID record for Yuxing Jiang [Opens in a new window] ,
Jingjing Xia Open the ORCID record for Jingjing Xia [Opens in a new window] ,
Zhongrui Li ,
Hongfei Jiao Open the ORCID record for Hongfei Jiao [Opens in a new window] ,
Xinshang Niu Open the ORCID record for Xinshang Niu [Opens in a new window] ,
Xiaochuan Ji ,
Siyu Dong ,
Xinbin Cheng Open the ORCID record for Xinbin Cheng [Opens in a new window] ,
Zhanshan Wang Open the ORCID record for Zhanshan Wang [Opens in a new window]  and
Jinlong Zhang Open the ORCID record for Jinlong Zhang [Opens in a new window]
Yuxing Jiang
Affiliation:
MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai, 200092, China Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
Jingjing Xia*
Affiliation:
MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai, 200092, China Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
Zhongrui Li
Affiliation:
MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai, 200092, China Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
Hongfei Jiao
Affiliation:
MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai, 200092, China Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
Xinshang Niu
Affiliation:
MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai, 200092, China Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
Xiaochuan Ji
Affiliation:
MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai, 200092, China Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
Siyu Dong
Affiliation:
MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai, 200092, China Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
Xinbin Cheng
Affiliation:
MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai, 200092, China Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
Zhanshan Wang
Affiliation:
MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai, 200092, China Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
Jinlong Zhang*
Affiliation:
MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai, 200092, China Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
*
*xiajj@tongji.edu.cn; jinlong@tongji.edu.cn
*xiajj@tongji.edu.cn; jinlong@tongji.edu.cn
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Abstract

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Keywords

MLDGlaser-induced damageelectric fieldlasers and laser optics

Information

Type
Research Article
Information
High Power Laser Science and Engineering , Accepted manuscript , pp. 1 - 21
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (https://creativecommons.org/licenses/by/4.0/), which permits unrestricted re-use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright
© The Author(s), 2026. Published by Cambridge University Press in association with Chinese Laser Press