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Dispersion effects on performance of free-electron laser based on laser wakefield accelerator

Published online by Cambridge University Press:  19 December 2018

Ke Feng
Affiliation:
State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China University of Chinese Academy of Sciences, Beijing 100049, China
Changhai Yu*
Affiliation:
State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Jiansheng Liu*
Affiliation:
State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China Collaborative Innovation Center of IFSA, Shanghai Jiao Tong University, Shanghai 200240, China
Wentao Wang*
Affiliation:
State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Zhijun Zhang
Affiliation:
State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Rong Qi
Affiliation:
State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Ming Fang
Affiliation:
State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China University of Chinese Academy of Sciences, Beijing 100049, China
Jiaqi Liu
Affiliation:
State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China University of Chinese Academy of Sciences, Beijing 100049, China
Zhiyong Qin
Affiliation:
State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China University of Chinese Academy of Sciences, Beijing 100049, China
Ying Wu
Affiliation:
State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China University of Chinese Academy of Sciences, Beijing 100049, China
Yu Chen
Affiliation:
State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China University of Chinese Academy of Sciences, Beijing 100049, China
Lintong Ke
Affiliation:
State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China University of Chinese Academy of Sciences, Beijing 100049, China
Cheng Wang
Affiliation:
State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Ruxin Li*
Affiliation:
State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China Collaborative Innovation Center of IFSA, Shanghai Jiao Tong University, Shanghai 200240, China School of Physical Science and Technology, ShanghaiTech University, Shanghai 200031, China
*
Correspondence to:  J. Liu, C. Yu, W. Wang, and R. Li, No. 390 Qinghe Road, Jiading District, Shanghai 200280, China. Email: michaeljs_liu@siom.ac.cn (J. Liu); yuchanghai@siom.ac.cn (C. Yu); wwt1980@siom.ac.cn (W. Wang); ruxinli@mail.shcnc.ac.cn (R. Li).
Correspondence to:  J. Liu, C. Yu, W. Wang, and R. Li, No. 390 Qinghe Road, Jiading District, Shanghai 200280, China. Email: michaeljs_liu@siom.ac.cn (J. Liu); yuchanghai@siom.ac.cn (C. Yu); wwt1980@siom.ac.cn (W. Wang); ruxinli@mail.shcnc.ac.cn (R. Li).
Correspondence to:  J. Liu, C. Yu, W. Wang, and R. Li, No. 390 Qinghe Road, Jiading District, Shanghai 200280, China. Email: michaeljs_liu@siom.ac.cn (J. Liu); yuchanghai@siom.ac.cn (C. Yu); wwt1980@siom.ac.cn (W. Wang); ruxinli@mail.shcnc.ac.cn (R. Li).
Correspondence to:  J. Liu, C. Yu, W. Wang, and R. Li, No. 390 Qinghe Road, Jiading District, Shanghai 200280, China. Email: michaeljs_liu@siom.ac.cn (J. Liu); yuchanghai@siom.ac.cn (C. Yu); wwt1980@siom.ac.cn (W. Wang); ruxinli@mail.shcnc.ac.cn (R. Li).

Abstract

In this study, we investigate a new simple scheme using a planar undulator (PU) together with a properly dispersed electron beam ($e$ beam) with a large energy spread (${\sim}1\%$) to enhance the free-electron laser (FEL) gain. For a dispersed $e$ beam in a PU, the resonant condition is satisfied for the center electrons, while the frequency detuning increases for the off-center electrons, inhibiting the growth of the radiation. The PU can act as a filter for selecting the electrons near the beam center to achieve the radiation. Although only the center electrons contribute, the radiation can be enhanced significantly owing to the high-peak current of the beam. Theoretical analysis and simulation results indicate that this method can be used for the improvement of the radiation performance, which has great significance for short-wavelength FEL applications.

Information

Type
Research Article
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted re-use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright
© The Author(s) 2018
Figure 0

Figure 1. SASE FEL scheme using the PU with the $e$ beam from the LWFA. The transverse distribution of the $e$ beam (a) without and (c) with the transverse dispersion. (b), (d) Corresponding angular profiles of the radiation power.

Figure 1

Figure 2. (a) Radiation power along the PU around 30 nm; (b) single-shot spectra of an SASE FEL; (c), (d) corresponding transverse angular profiles of the radiation power obtained by $e$ beam without and with the horizontal dispersion.

Figure 2

Table 1. $E$ beam and undulator parameters used in our study for EUV and soft X-ray FELs.

Figure 3

Figure 3. (a) Radiation power along the PU around 3.9 nm; (b) single-shot spectra of the SASE FEL; (c), (d) corresponding transverse angular profiles of the radiation power obtained by $e$ beam without and with the horizontal dispersion.

Figure 4

Figure 4. SASE FEL (a) radiation power, (b) bandwidth and (c) transverse mode parameter at 30 nm at the exit of the undulator with different dispersions of the $e$ beam in the PU (blue) and TGU (red) schemes.

Figure 5

Figure 5. Negative imaginary part of the FEL growth rate $\hat{\unicode[STIX]{x1D707}}$ (in units of $2\unicode[STIX]{x1D70C}_{T}k_{u}$) as a function of the horizontal position (in units of $\unicode[STIX]{x1D70E}_{T}$) for both the PU and TGU schemes in the fundamental mode ($D_{x}=2.5$ cm).

Figure 6

Figure 6. (a) SASE FEL power with different halfwidths of the slit at the entrance of the undulator in the PU scheme. (b)–(e) Horizontal distribution of the radiation with different halfwidths of the slit in the PU scheme. The halfwidths of the slit are $0.5\unicode[STIX]{x1D70E}_{T}$, $1.0\unicode[STIX]{x1D70E}_{T}$, $1.5\unicode[STIX]{x1D70E}_{T}$ and $3\unicode[STIX]{x1D70E}_{T}$, respectively. The horizontal dispersion is 2.5 cm.