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Efficient plasma-based polarization converter for intense X-ray lasers

Published online by Cambridge University Press:  22 January 2026

Yijie Dong
Affiliation:
Shenzhen Key Laboratory of Ultraintense Laser and Advanced Material Technology, Center for Intense Laser Application Technology, and College of Engineering Physics, Shenzhen Technology University , Shenzhen, China
Taiwu Huang*
Affiliation:
Shenzhen Key Laboratory of Ultraintense Laser and Advanced Material Technology, Center for Intense Laser Application Technology, and College of Engineering Physics, Shenzhen Technology University , Shenzhen, China
Peng Chen
Affiliation:
Shenzhen Key Laboratory of Ultraintense Laser and Advanced Material Technology, Center for Intense Laser Application Technology, and College of Engineering Physics, Shenzhen Technology University , Shenzhen, China
Ke Jiang
Affiliation:
Shenzhen Key Laboratory of Ultraintense Laser and Advanced Material Technology, Center for Intense Laser Application Technology, and College of Engineering Physics, Shenzhen Technology University , Shenzhen, China
Hao Peng
Affiliation:
Shenzhen Key Laboratory of Ultraintense Laser and Advanced Material Technology, Center for Intense Laser Application Technology, and College of Engineering Physics, Shenzhen Technology University , Shenzhen, China
Ran Li
Affiliation:
Shenzhen Key Laboratory of Ultraintense Laser and Advanced Material Technology, Center for Intense Laser Application Technology, and College of Engineering Physics, Shenzhen Technology University , Shenzhen, China
Mingyang Yu
Affiliation:
Shenzhen Key Laboratory of Ultraintense Laser and Advanced Material Technology, Center for Intense Laser Application Technology, and College of Engineering Physics, Shenzhen Technology University , Shenzhen, China
Cangtao Zhou
Affiliation:
Shenzhen Key Laboratory of Ultraintense Laser and Advanced Material Technology, Center for Intense Laser Application Technology, and College of Engineering Physics, Shenzhen Technology University , Shenzhen, China
*
Correspondence to: T. Huang, College of Engineering Physics, Shenzhen Technology University, Shenzhen 518118, China. Email: taiwu.huang@sztu.edu.cn

Abstract

Precise control of the polarization of X-ray lasers is crucial in broad applications such as ultrafast-physics experiments and material characterization. Existing X-ray polarization converters, however, are mainly suited for low-power conditions and usually suffer from either large size or low conversion efficiency. Here we propose a compact and efficient scheme for polarization conversion of high-power, high-intensity femtosecond X-ray lasers, based on linear total internal reflection at the interface of the vacuum and solid-density plasma plate. Particle-in-cell simulations show that although the reflectivity is affected by the density oscillations of the surface plasma waves that are inevitably excited, the single-pass reflectivity can still exceed 95% and approach 100% for a broad range of laser parameters. Beyond its high conversion efficiency and damage resistance, this method offers dynamic tunability and enables ultrafast polarization switching (sub-ps), positioning it as a compact and innovative solution for polarization control in high-power X-ray laser systems.

Information

Type
Research Article
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (https://creativecommons.org/licenses/by/4.0), which permits unrestricted re-use, distribution and reproduction, provided the original article is properly cited.
Copyright
© The Author(s), 2026. Published by Cambridge University Press in association with Chinese Laser Press
Figure 0

Figure 1 (a) Schematic of the proposed scheme. (b) Total internal reflection at the plasma surface. Here, E denotes the electric field, while the superscripts i, t and r denote the incident, refracted and reflected light, respectively. The subscripts s and p denote the s- and p-polarization components of the laser.

Figure 1

Figure 2 Electric field distributions in the laser–plasma interaction. Electric field of the incident laser pulse at (a) $t=60{T}_0$ and (b) at $t=82{T}_0$, as it reaches the surface. (c) Electric field distribution of the circularly polarized reflected wave at $t=120{T}_0$. Electric field on the laser axis of (d) the incident laser and (e) the reflected pulse. In the above, the laser incidence angle is $41.3{}^{\circ}$. (f) Electric field of the reflected pulse for $0{}^{\circ}$ incidence angle. In all the lower panels, the 3D field vector (red), profiles of the two orthogonal field components ${E}_\mathrm{s}$ (green) and ${E}_\mathrm{p}$ (blue) and the projection of ${E}_\mathrm{s}-{E}_\mathrm{p}$ (orange) are displayed.

Figure 2

Figure 3 (a) The s-polarized electric field of the surface wave ${E}_\mathrm{s}^{\mathrm{t}}$ at different moments. (b) The transmission coefficient of ${E}_\mathrm{s}^{\mathrm{t}}$ at different incident angles.

Figure 3

Figure 4 (a) The Stokes parameter P under different incident angles. (b) Reflection efficiencies for different normalized laser amplitudes ${a}_0$. (c) The laser intensity distribution of the reflected wave when the normalized laser amplitude ${a}_0=0.087$. (d) The laser intensity distribution of the reflected wave when the normalized laser amplitude ${a}_0=0.87$. To display the distribution of the transmitted laser, the magnitude of the colorbar is reduced by two orders of magnitude.

Figure 4

Figure 5 (a) Electron density and electric field variation at the interface for ${a}_0=0.87$. (b) Electric field of surface wave versus ${a}_0$. (c) Electron density distribution for ${a}_0=0.087$. (d) Electron density distribution for ${a}_0=0.87$.

Figure 5

Figure 6 (a) Electron density distribution under the conditions of ${a}_0=0.87$ and $\lambda =800\;\mathrm{nm}$. (b) Electric field intensity distribution along the central axis of the reflected laser when ${a}_0=0.087$ and $\lambda =800\;\mathrm{nm}$. (c) Electric field of the reflected laser along the central axis, where the incident laser is set to linear polarization with a $60{}^{\circ}$ angle in the yz plane. (d) Three-dimensional state distribution diagram derived from the same dataset as in (c).

Figure 6

Figure 7 (a) Electric field of the reflected laser along the central axis at $b=1$. (b) Electric field of the reflected laser along the central axis at $b=5$. (c) Electric field distribution at the interaction moment when $b=1$. (d) Electric field distribution at the interaction moment when $b=5$.

Figure 7

Figure 8 The 3D simulation results of (a) the spatial intensity distribution of the reflected laser and (b) the electric field intensity along the central axis of the reflected laser at $z=0$.

Figure 8

Figure 9 (a) Plasma density distribution of concave structures with a surface roughness of 2–10 nm. (b) Electric field intensity distribution along the central axis of the reflected laser (R = 10 nm).