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Thin-film flow due to an asymmetric distribution of surface tension and applications to surfactant deposition – ERRATUM

Published online by Cambridge University Press:  29 April 2026

Jun Eshima Open the ORCID record for Jun Eshima [Opens in a new window] ,
Luc Deike Open the ORCID record for Luc Deike [Opens in a new window]  and
Howard A. Stone Open the ORCID record for Howard A. Stone [Opens in a new window]
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Abstract

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Information

Type
Erratum
Information
Journal of Fluid Mechanics , Volume 1034 , 10 May 2026 , E3
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Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (https://creativecommons.org/licenses/by/4.0/), which permits unrestricted re-use, distribution and reproduction, provided the original article is properly cited.
Copyright
© The Author(s), 2026. Published by Cambridge University Press

The publisher apologises that the supplementary material was omitted upon publication.

This has now been added.

References

Eshima, J, Deike, L & Stone, HA. 2024 Thin-film flow due to an asymmetric distribution of surface tension and applications to surfactant deposition. J. Fluid Mech. 992, A2. doi: 10.1017/jfm.2024.501.CrossRefGoogle Scholar
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