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High-energy, high-peak-power, sub-nanosecond, spatial super-Gaussian 177 nm vacuum ultraviolet laser

Published online by Cambridge University Press:  16 December 2024

Ning Wen
Affiliation:
Key Laboratory of Solid-State Laser, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, China University of Chinese Academy of Sciences, Beijing, China
Tian-Hao Lv
Affiliation:
Key Laboratory of Solid-State Laser, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, China University of Chinese Academy of Sciences, Beijing, China
Nan Zong*
Affiliation:
Key Laboratory of Solid-State Laser, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, China Key Laboratory of Functional Crystal and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, China Institute of Optical Physics and Engineering Technology, Qilu Zhongke, Jinan, China
Hong-Wei Gao
Affiliation:
Key Laboratory of Solid-State Laser, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, China Key Laboratory of Functional Crystal and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, China Institute of Optical Physics and Engineering Technology, Qilu Zhongke, Jinan, China
Yong Bo
Affiliation:
Key Laboratory of Solid-State Laser, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, China Key Laboratory of Functional Crystal and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, China Institute of Optical Physics and Engineering Technology, Qilu Zhongke, Jinan, China
Qin-Jun Peng
Affiliation:
Key Laboratory of Solid-State Laser, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, China Key Laboratory of Functional Crystal and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, China Institute of Optical Physics and Engineering Technology, Qilu Zhongke, Jinan, China
Da-Fu Cui
Affiliation:
Key Laboratory of Solid-State Laser, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, China Key Laboratory of Functional Crystal and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, China
Zu-Yan Xu
Affiliation:
Key Laboratory of Solid-State Laser, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, China Key Laboratory of Functional Crystal and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, China
Xiao-Yang Wang
Affiliation:
Key Laboratory of Functional Crystal and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, China
Li-Juan Liu*
Affiliation:
Key Laboratory of Functional Crystal and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, China
Ru-Kang Li
Affiliation:
Key Laboratory of Functional Crystal and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, China
Nan Wang
Affiliation:
Laboratory of All-Solid-State Light Source, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, China
Xue-Chun Lin
Affiliation:
Laboratory of All-Solid-State Light Source, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, China
*
Correspondence to: N. Zong and L.-J. Liu, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China. Emails: zongnan@mail.ipc.ac.cn (N. Zong); llj@mail.ipc.ac.cn (L.-J. Liu)
Correspondence to: N. Zong and L.-J. Liu, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China. Emails: zongnan@mail.ipc.ac.cn (N. Zong); llj@mail.ipc.ac.cn (L.-J. Liu)

Abstract

A high-energy pulsed vacuum ultraviolet (VUV) solid-state laser at 177 nm with high peak power by the sixth harmonic of a neodymium-doped yttrium aluminum garnet (Nd:YAG) amplifier in a KBe2BO3F2 prism-coupled device was demonstrated. The ultraviolet (UV) pump laser is a 352 ps pulsed, spatial top-hat super-Gaussian beam at 355 nm. A high energy of a 7.12 mJ VUV laser at 177 nm is obtained with a pulse width of 255 ps, indicating a peak power of 28 MW, and the conversion efficiency is 9.42% from 355 to 177 nm. The measured results fitted well with the theoretical prediction. It is the highest pulse energy and highest peak power ever reported in the VUV range for any solid-state lasers. The high-energy, high-peak-power, and high-spatial-uniformity VUV laser is of great interest for ultra-fine machining and particle-size measurements using UV in-line Fraunhofer holography diagnostics.

Information

Type
Research Article
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (https://creativecommons.org/licenses/by/4.0), which permits unrestricted re-use, distribution and reproduction, provided the original article is properly cited.
Copyright
© The Author(s), 2024. Published by Cambridge University Press in association with Chinese Laser Press
Figure 0

Figure 1 Schematic diagram of the high-energy sub-nanosecond VUV laser at 177 nm. Inset: detailed schematic structure of the KBBF-PCD in our experiment.

Figure 1

Figure 2 Calculated conversion efficiency from 355 to 177 nm versus KBBF effective crystal length for Gaussian beam G = 1 and SGB G = 4 at the pump energies of 100 and 75 mJ with a beam diameter of 5 mm.

Figure 2

Figure 3 Dependence of output energy of the 177 nm laser and conversion efficiency of the pump energy at 355 nm.

Figure 3

Figure 4 Simulated 355 and 177 nm pulse temporal profiles. Inset: measured pulse profile of the 355 nm laser.

Figure 4

Figure 5 Measured spectrum of the pump laser and near-field 2D beam spatial profile at 355 nm.

Figure 5

Figure 6 Fluorescence patterns on the fluorescence glass induced by the residual beam at 355 nm and the generated beam at 177 nm.