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Progress of the injection laser system of SG-II

Published online by Cambridge University Press:  19 June 2018

Wei Fan*
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Youen Jiang
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Jiangfeng Wang
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Xiaochao Wang
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Dajie Huang
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Xinghua Lu
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Hui Wei
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Guoyang Li
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Xue Pan
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Zhi Qiao
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Chao Wang
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
He Cheng
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Peng Zhang
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Wenfa Huang
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Zhuli Xiao
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Shengjia Zhang
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Xuechun Li
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Jianqiang Zhu
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Zunqi Lin
Affiliation:
National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
*
Correspondence to: W. Fan, No. 390, Qinghe Road, Jiading, Shanghai 201800, China. Email: fanweil@siom.ac.cn

Abstract

A high power laser system was used to drive the ignition of inertial confinement fusion (ICF), of which the high energy, the uniform focal spot, the accurate laser waveform, and the synchronization between the laser beams are key parameters. To accomplish this, global laser characteristics control should be assured, which was the main purpose of the injection laser system. In this paper, the key technological progress involved in the improvement of the performance of the injection laser of SG-II is reported, including frequency domain control, time domain control, near-field spatial shaping, pre-amplifier technology, and the optical parametric chirped pulse amplification pump source.

Information

Type
Research Article
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted re-use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright
© The Author(s) 2018
Figure 0

Figure 1. High power laser diagram.

Figure 1

Figure 2. The early integrated waveguide front-end system and pre-amplifier of SG-II (AMP: amplifier).

Figure 2

Figure 3. The function of the injection laser system of SG-II.

Figure 3

Table 1. The specifications of SG-II.

Figure 4

Figure 4. (a) The spectrum of a single frequency output; (b) the broadened spectrum with 3 GHz phase modulation; (c) the broadened spectrum with 22 GHz modulation; (d) the broadened spectrum with $3~\text{GHz}+22~\text{GHz}$ modulation.

Figure 5

Figure 5. (a) The relationship between the effective length and the actual length of the crystal under different velocity matching conditions (the design frequency is 10.5 GHz, the crystal is lithium niobate). (b) The structure of the resonant cavity modulator based on the cut-off waveguide (A: the injection waveguide; B, D: cutoff waveguide; C: electro-optic crystal).

Figure 6

Table 2. The key parameters of the bulk phase modulators of SG-II and OMEGA.

Figure 7

Figure 6. (a) The bulk modulator prototype. (b) $S_{11}$ curve of 10.302 GHz bulk modulator.

Figure 8

Figure 7. (a) The illustration and (b) physical map of the fail-safe system.

Figure 9

Figure 8. (a) High-resolution single-shot spectrometer prototype; (b) the calibration results with the wavelength meter.

Figure 10

Figure 9. The laser spectrum (bandwidth is 0.52 nm) which was measured using a home-made single-shot spectrometer.

Figure 11

Figure 10. The early synchronization scheme of SG-II between the nanosecond shaped laser and the short pulse picosecond laser.

Figure 12

Figure 11. Improved optically driven synchronization schematic.

Figure 13

Figure 12. Synchronization stability testing results for (a) 4 minutes and (b) 2 hours between the nanosecond laser and the picosecond pulse laser.

Figure 14

Figure 13. Homologous clock-lock, phase-locked frequency synchronization scheme.

Figure 15

Figure 14. The temporal pulse shaping schematic.

Figure 16

Figure 15. The high contrast temporal waveform (600 : 1). (a) Low amplitude pedestal; (b) high amplitude step.

Figure 17

Figure 16. (a) Pre-placed injection waveform and (b) AWG closed-loop deviation.

Figure 18

Figure 17. (a) The main amplifier output waveform; (b) the actual output and the expected output deviation.

Figure 19

Figure 18. (a) The output laser waveform of Nd-doped regenerative amplifier and (b) the output laser waveform of one beam of SG-II at 5000 J, $1\unicode[STIX]{x1D714}$ (0.3 nm).

Figure 20

Figure 19. The output spectrum with the 3 GHz and 22 GHz phase modulation.

Figure 21

Figure 20. (a) The output waveform of the polarization-maintaining front-end system; (b) the output waveform of the single polarization front-end system.

Figure 22

Figure 21. Phase modulation-to-amplitude modulation real-time monitoring software interface.

Figure 23

Figure 22. FM-to-AM changes of single polarization front-end system (a) for 5 minutes and (b) for 3 hours.

Figure 24

Figure 23. (a) Serrated aperture and (b) binary mask aperture.

Figure 25

Figure 24. High damage threshold static near-field control element.

Figure 26

Figure 25. The experimental results of the uniform intensity distribution (a) after shaped by anti-Gauss beam mask and the parabola distribution after shaped by pre-compensating binary mask of which the peak/center transmission ratio is 5 : 1. (b) The elliptical near-field distribution using binary mask.

Figure 27

Figure 26. (a) The distribution of the binary mask. (b) The distribution of the four-pass amplifier without pre-compensation mask. (c) The output near-field distribution of the four-pass amplifier with pre-compensation mask.

Figure 28

Figure 27. (a) The near-field distribution of SG-II-upgrade when operated at 8000 J without the second near-field binary shaping mask. (b) The design graphics of the 2nd near-field binary shaping mask. (c) The near-field distribution of SG-II when operated at 17,600 J with the second near-field binary mask.

Figure 29

Figure 28. (a) Working principle and (b) the inner structure of the integrated optically addressed spatial modulator.

Figure 30

Figure 29. (a) Optical addressing liquid crystal spatial light modulator physical map. (b) Near-field spatial intensity distribution control demonstration.

Figure 31

Figure 30. Near-field intensity distribution control strategy (OALAV: optically addressed liquid addressed valve).

Figure 32

Figure 31. The scheme of the regenerative amplifier.

Figure 33

Figure 32. (a) The regenerative amplifier; (b) the output near-field spot; (c) the energy stability of the regenerative amplifier for one day; (d) the square-pulse distortion of the regenerative amplifier.

Figure 34

Figure 33. Off-axis four-pass amplifier optical path diagram.

Figure 35

Figure 34. Four-pass amplifier near-field beam spatial distribution. (b) is the one-dimensional distribution of (a).

Figure 36

Figure 35. Four-pass pre-amplifier output focal spot distribution. (a) Two-dimensional distribution; (b) surrounding energy distribution.

Figure 37

Figure 36. Coaxial four-pass amplifier structure.

Figure 38

Figure 37. Near-field intensity distribution (a) without pre-compensation and (b) with pre-compensation.

Figure 39

Figure 38. (a) Far-field intensity distribution and (b) surrounding energy distribution.

Figure 40

Figure 39. The output energy stability of repetition pre-amplifier.

Figure 41

Figure 40. Picosecond joule multi-functional experimental platform.

Figure 42

Figure 41. (a) Output energy changes and (b) stability histograms.

Figure 43

Figure 42. (a) Injection and output spectra. (b) Pulse width after compression.

Figure 44

Figure 43. Parameter to amplify the signal-to-noise ratio measurement after compression.

Figure 45

Figure 44. (a) The near-field light spot. (b) The near-field wavefront. (c) Far-field ambient energy.

Figure 46

Figure 45. The OPCPA pump source includes: Nd:YAG regenerative amplifier, beam expander, soft-edge iris, spatial filter, three-stage Nd:YAG rod amplifier and frequency multiplier.

Figure 47

Figure 46. (a) The output time waveform of the front end and (b) final output of the OPCPA pump source.

Figure 48

Figure 47. The energy stability of the OPCPA pump source.

Figure 49

Figure 48. The near-field distribution of the OPCPA pump source.