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Models for nanoindentation of compliant films on stiffsubstrates

Published online by Cambridge University Press:  11 June 2015

Yang Li
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA
Pavan Valavala
Affiliation:
Department of Mechanical Engineering, Northwestern University, Evanston, Illinois 60208, USA
Supinda Watcharotone
Affiliation:
Department of Mechanical Engineering, Northwestern University, Evanston, Illinois 60208, USA
L. Catherine Brinson*
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA; and Department of Mechanical Engineering, Northwestern University, Evanston, Illinois 60208, USA
*
a)Address all correspondence to thisauthor. e-mail: cbrinson@northwestern.edu
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Abstract

Nanoindentation is an effective approach for measuring mechanical properties ofnanoscale films coated on substrates, yet results obtained through the classicOliver–Pharr model require additional consideration due to the existenceof a “substrate effect” when the film is much more compliant thanthe substrate. In this study, different models for removing this substrateeffect are compared, with focus on the Gao model, the Saha–Nix model, andthe Hay model and the use of a direct finite element (FE) approach is discussed.Validity of these models is examined using load–displacement dataobtained from simulated indentation of an elastic–plastic film in FEs. Itis found that the performance of the analytical models varies significantly withdifferent testing parameters, including ratio between film modulus and substratemodulus (Ef/Es),indenting ratio (hmax/film thickness), and yieldstrain. Choices of using a nanoindentation model to process experimental datashould be made according to estimated indentation depth and modulus differencebetween film and substrate. An example of applying substrate removal models toexperimental data is also shown.

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Copyright
Copyright © Materials Research Society 2015 

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