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Accepted manuscript

Improvement in High-Average-Power Laser Resistance of an Optically Addressed Spatial Light Modulator Based on a New Air-Gap Structure

Published online by Cambridge University Press:  10 February 2026

Zimu Li Open the ORCID record for Zimu Li [Opens in a new window] ,
Dajie Huang ,
Wei Fan Open the ORCID record for Wei Fan [Opens in a new window] ,
He Cheng ,
YanTao Song  and
Meng Teng Open the ORCID record for Meng Teng [Opens in a new window]
Zimu Li
Affiliation:
Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and, China
Dajie Huang*
Affiliation:
Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and, China
Wei Fan*
Affiliation:
Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and, China
He Cheng
Affiliation:
Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and, China
YanTao Song
Affiliation:
Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and, China
Meng Teng
Affiliation:
Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fin, China
*
*Correspondence to: Dajie Huang, Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China. Email: hdajie@siom.ac.cn
**Wei Fan, Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China. Email: fanweil@siom.ac.cn
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Abstract

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Keywords

Optically Addressed Spatial Light ModulatorLaser ResistanceSapphireBeam Intensity ShapingThermal Effect

Information

Type
Research Article
Information
High Power Laser Science and Engineering , Accepted manuscript , pp. 1 - 25
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (https://creativecommons.org/licenses/by/4.0/), which permits unrestricted re-use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright
© The Author(s), 2026. Published by Cambridge University Press in association with Chinese Laser Press