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Random pinhole attenuator for high-power laser beams

Published online by Cambridge University Press:  01 April 2024

Seong Cheol Park
Affiliation:
Department of Physics and Photon Science, Gwangju Institute of Science and Technology, Gwangju, Republic of Korea Center for Relativistic Laser Science, Institute for Basic Science, Gwangju, Republic of Korea
Hyeok Yun
Affiliation:
Center for Relativistic Laser Science, Institute for Basic Science, Gwangju, Republic of Korea Advanced Photonics Research Institute, Gwangju Institute of Science and Technology, Gwangju, Republic of Korea
Jin Woo Yoon
Affiliation:
Center for Relativistic Laser Science, Institute for Basic Science, Gwangju, Republic of Korea Advanced Photonics Research Institute, Gwangju Institute of Science and Technology, Gwangju, Republic of Korea
Seong Ku Lee
Affiliation:
Center for Relativistic Laser Science, Institute for Basic Science, Gwangju, Republic of Korea Advanced Photonics Research Institute, Gwangju Institute of Science and Technology, Gwangju, Republic of Korea
Jae Hee Sung
Affiliation:
Center for Relativistic Laser Science, Institute for Basic Science, Gwangju, Republic of Korea Advanced Photonics Research Institute, Gwangju Institute of Science and Technology, Gwangju, Republic of Korea
Il Woo Choi
Affiliation:
Center for Relativistic Laser Science, Institute for Basic Science, Gwangju, Republic of Korea Advanced Photonics Research Institute, Gwangju Institute of Science and Technology, Gwangju, Republic of Korea
Chang Hee Nam
Affiliation:
Department of Physics and Photon Science, Gwangju Institute of Science and Technology, Gwangju, Republic of Korea Center for Relativistic Laser Science, Institute for Basic Science, Gwangju, Republic of Korea
Kyung Taec Kim*
Affiliation:
Department of Physics and Photon Science, Gwangju Institute of Science and Technology, Gwangju, Republic of Korea Center for Relativistic Laser Science, Institute for Basic Science, Gwangju, Republic of Korea
*
Correspondence to: Kyung Taec Kim, Center for Relativistic Laser Science, Institute for Basic Science, Gwangju 61005, Republic of Korea. Email: kyungtaec@gist.ac.kr

Abstract

The intensity attenuation of a high-power laser is a frequent task in the measurements of optical science. Laser intensity can be attenuated by inserting an optical element, such as a partial reflector, polarizer or absorption filter. These devices are, however, not always easily applicable, especially in the case of ultra-high-power lasers, because they can alter the characteristics of a laser beam or become easily damaged. In this study, we demonstrated that the intensity of a laser beam could be effectively attenuated using a random pinhole attenuator (RPA), a device with randomly distributed pinholes, without changing the beam properties. With this device, a multi-PW laser beam was successfully attenuated and the focused beam profile was measured without any alterations of its characteristics. In addition, it was confirmed that the temporal profile of a laser pulse, including the spectral phase, was preserved. Consequently, the RPA possesses significant potential for a wide range of applications.

Information

Type
Research Article
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (https://creativecommons.org/licenses/by/4.0), which permits unrestricted re-use, distribution and reproduction, provided the original article is properly cited.
Copyright
© The Author(s), 2024. Published by Cambridge University Press in association with Chinese Laser Press
Figure 0

Figure 1. Attenuation of laser intensity using a random pinhole attenuator (RPA). (a) Schematic diagram for attenuating the laser intensity using the RPA. (b) Intensity of the laser beam on the yz-plane shown in (a). (c) Intensity distribution at the focal plane calculated for different numbers of pinholes.

Figure 1

Figure 2. Random pinhole array fabricated with a number-density gradient. (a) Simplified model of the random pinhole array. (b), (c) Microscope images of the random pinhole array obtained with (b) 20× and (c) 50× magnification.

Figure 2

Figure 3. Beam profiles of the focused beam. (a)–(d) The beam profiles of the focused beam and the distorted beam. The intensity is attenuated using (a), (c) an ND filter (Thorlabs NDC-100C-4M) and (b), (d) a random pinhole attenuator (RPA). (e) The intensity lineouts along the x-axis of the beam shown in (a) and (b). The x-axis represents the distance from the beam’s center, while the y-axis depicts the relative intensity on a logarithmic scale. (f) The measured optical density versus the angle of the variable attenuation board. OD denotes the optical density.

Figure 3

Figure 4. Photos of an RPA. (a) RPA fabricated on an aluminum foil by laser drilling. (b) Magnified image showing randomly distributed pinholes. (c) Image of a pinhole.

Figure 4

Figure 5. Beam profiles of the CoReLS 4 PW laser. (a) Beam profile of the focused 10-μJ laser beam without passing through the plasma mirror system and (b) beam profile of the focused laser beam obtained with the plasma mirror system. The energy of the laser beam was 80 J before the grating pulse compressor. (c) The schematics of the CoReLS 4 PW laser. The plasma mirrors (PMs), RPA and off-axis parabola (OAP) are shown.

Figure 5

Figure 6. Comparison of temporal characteristics of two attenuation cases. (a) Laser electric fields obtained with an ND filter (red line) and with an RPA (blue line). (b) Spectral intensities and phases of the two cases.