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Microstructure design for fast oxygen conduction

Published online by Cambridge University Press:  11 November 2015

Dilpuneet S. Aidhy*
Affiliation:
Department of Mechanical Engineering, University of Wyoming, Laramie, Wyoming 82071, USA; and Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA
William J. Weber
Affiliation:
Materials Science and Engineering, University of Tennessee, Knoxville, Tennessee 37996, USA; and Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA
*
a) Address all correspondence to this author. e-mail: daidhy@uwyo.edu

Abstract

In the past decade, the research in designing fast oxygen conducting materials for electrochemical applications has largely shifted to microstructural features, in contrast to material-bulk. In particular, understanding oxygen energetics in heterointerface materials is currently at the forefront, where interfacial tensile strain is being considered as the key parameter in lowering oxygen migration barriers. Nanocrystalline materials with high densities of grain boundaries have also gathered interest that could possibly allow leverage over excess volume at grain boundaries, providing fast oxygen diffusion channels similar to those previously observed in metals. In addition, near-interface phase transformations and misfit dislocations are other microstructural phenomenon/features that are being explored to provide faster diffusion. In this review, the current understanding on oxygen energetics, i.e., thermodynamics and kinetics, originating from these microstructural features is discussed. Experimental observations, theoretical predictions and novel atomistic mechanisms relevant to oxygen transport are highlighted. In addition, the interaction of dopants with oxygen vacancies in the presence of these new microstructural features, and their future role in the design of future fast-ion conductors, is outlined.

Information

Type
Early Career Scholars in Materials Science: Review
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted re-use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright
Copyright © Materials Research Society 2015
Figure 0

FIG. 1. Interfacial features for fast oxygen ion-diffusion at (a) layered heterointerfaces. (b) Grain boundaries. (c) Tensile strain on substrate material lowers oxygen migration barrier due to bond stretching. (d) Excess volume at grain boundaries. (e) Interfacial-strain controlled vacancy stability. (f) Vacancy segregation at grain boundaries.

Figure 1

FIG. 2. Dopant segregation at grain boundaries. (a) Σ5 (310) 〈001〉 tilt grain boundary in CeO2. (b) Segregation energy for two cation sites at the boundary.

Figure 2

FIG. 3. Ca and La weighted intensities in LCMO|STO interface structure as a function of normalized distance from the interface. (a) For (110) deposited LCMO films, (b) for (001) deposition LCMO films. The horizontal lines indicate initial composition, and the vertical line indicates a distance of 3.5 nm below the surface. Reproduced from Ref. 99.

Figure 3

FIG. 4. Dopant segregation at heterointerfaces. (a) Model heterointerface structure showing between ZrO2|CeO2 showing the change in O–O distance due to interfacial strain. (b) Dopant segregation in CeO2–ZrO2 and CeO2–ThO2 interfaces.

Figure 4

FIG. 5. Arrhenius plot of as-deposited, 1000 °C annealed and 1200 °C annealed 12 mol% YDC samples. Oxygen conductivity decreases as grain size increases due to grain growth under high temperature annealing. Reproduced from Ref. 81.

Figure 5

FIG. 6. Oxygen energetics at grain boundaries and heterointerfaces. (a) Oxygen vacancy migration energy in bulk and near grain boundary in undoped and doped CeO2 both along and across the grain boundary. The migration energy decreases near grain boundaries. (b) Comparison between dopant-oxygen vacancy binding energy at grain boundary and in bulk. The binding energy is higher at grain boundaries than in the bulk. (c) Comparison between oxygen vacancy migration energies at the CeO2–ThO2 interface to that in the bulk-CeO2 in the presence of dopants. The migration energies are lower at interfaces than in bulk-CeO2 due to tensile strain at the interface. (d) Dopant-oxygen vacancy binding energy at the interface and in the bulk. The binding energies are lower in the bulk compared to that at the interface.

Figure 6

FIG. 7. Oxygen vacancy formation energies under tensile strain for (a) CaMnO3 and (b) CeO2. Relative oxygen vacancy formation energy with respect to no strain in (c) SrTiO3 and (d) La0.5Sr0.5CoO3−δ. The data in (a), (c) and (d) are reproduced from Refs. 59, 109, and 110, respectively.

Figure 7

FIG. 8. Oxygen vacancy stability in the SrTiO3|MgO interface in (a)–(c). (a) Interface structure and four locations tested of oxygen vacancies tested for stability represented with black squares. (b) Comparison of oxygen vacancy stability at four locations with reference to site A. Calculations are done for the three strain cases as discussed in text. (c) Oxygen vacancy stability difference between site A and D under increasing strain. (d) Oxygen vacancy relative stability in the ZrO2–ThO2 interface with reference to vacancy stability at the interface (orange diamonds).