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Nanoscale magnetization reversal by electric field-induced ion migration

Published online by Cambridge University Press:  17 September 2018

Qilai Chen
Affiliation:
CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, Zhejiang 315201, China School of Mechanical Engineering, Xiangtan University, Xiangtan, Hunan 411105, China Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
Gang Liu*
Affiliation:
CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, Zhejiang 315201, China Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
Shuang Gao
Affiliation:
CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, Zhejiang 315201, China Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
Xiaohui Yi
Affiliation:
CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, Zhejiang 315201, China Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
Wuhong Xue
Affiliation:
CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, Zhejiang 315201, China Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
Minghua Tang
Affiliation:
School of Materials Science and Engineering, Xiangtan University, Xiangtan, Hunan 411105, China
Xuejun Zheng*
Affiliation:
School of Mechanical Engineering, Xiangtan University, Xiangtan, Hunan 411105, China
Run-Wei Li*
Affiliation:
CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, Zhejiang 315201, China Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
*
Address all correspondence to Gang Liu, Xuejun Zheng, Run-Wei Li at liug@nimte.ac.cn, zhengxuejun@xtu.edu.cn, runweili@nimte.ac.cn
Address all correspondence to Gang Liu, Xuejun Zheng, Run-Wei Li at liug@nimte.ac.cn, zhengxuejun@xtu.edu.cn, runweili@nimte.ac.cn
Address all correspondence to Gang Liu, Xuejun Zheng, Run-Wei Li at liug@nimte.ac.cn, zhengxuejun@xtu.edu.cn, runweili@nimte.ac.cn

Abstract

Nanoscale magnetization modulation by electric field enables the construction of low-power spintronic devices for information storage applications and, etc. Electric field-induced ion migration can introduce desired changes in the material's stoichiometry, defect profile, and lattice structure, which in turn provides a versatile and convenient means to modify the materials’ chemical-physical properties at the nanoscale and in situ. In this review, we provide a brief overview on the recent study on nanoscale magnetization modulation driven by electric field-induced migration of ionic species either within the switching material or from external sources. The formation of magnetic conductive filaments that exhibit magnetoresistance behaviors in resistive switching memory via foreign metal ion migration and redox activities is also discussed. Combining the magnetoresistance and quantized conductance switching of the magnetic nanopoint contact structure may provide a future high-performance device for non-von Neumann computing architectures.

Information

Type
Prospective Articles
Copyright
Copyright © Materials Research Society 2018 
Figure 0

Figure 1. Electric field-induced magnetization reversal in CFO thin films. (a) Schematic illustration of the experimental setups for the C-AFM and MFM measurements. (b), (d) Morphologies of the CFO thin film at the pristine state and (c), (e) corresponding MFM images of the CFO thin film at the pristine state and after being subjected to biased voltages of −3 and 3 V, respectively. Scale bar: 300 nm. Adapted with permission from Ref. 23 (American Chemical Society, 2015).

Figure 1

Figure 2. Reversible magnetization reversal under various electric fields. (a) MFM images of the CFO thin film at the pristine state and after being subjected to various biased voltages. Scale bar: 200 nm. (b) Evolution of the contrast change ratio after being subjected to various biased voltages in the sequence 0 V–4 V–0 V–4 V–0 V–4 V. Adapted with permission from Ref. 23 (American Chemical Society, 2015).

Figure 2

Figure 3. Theoretical model for the electric field-induced magnetization reversal in a CFO unit cell. (a) Lattice structure of an ideal CoFe2O4 unit cell (left panel) and the corresponding (110) plane (right panel). The dashed box marks the distribution of the cations along the [110] direction. (b) Dependence of the formation energy of the Co vacancy, A-site Fe vacancy, and B-site Fe vacancy on the oxygen chemical potential. (c) Localized structures of the CFO unit cell with different locations of the Fe vacancy occupation. (d), (e) Localized structures and preferred magnetizations of the CFO unit cell with a Fe vacancy present along the [110] direction and with different locations of the Co occupation after the occurrence of electric field-induced migration of Co2+ ions. The shaded brown spheres represent oxygen atoms located outside the [110] crystal plane under evaluation. Reproduced with permission from Ref. 23. (American Chemical Society, 2015).

Figure 3

Figure 4. (a) Schematic of the Combinatorial Substrate Epitaxy (CSE) approach to derive the structure-property relationship at the grain scale: (1) Rough polycrystalline surface; (2) topography image of the polished surface; (3) the orientation of the substrate grains determined by Electron Backscattered Diffraction (EBSD); and (4) EBSD/Energy-dispersive x-ray spectroscopy mapping and scanning probe microscopy performed over the same region of the polycrystalline substrate after film deposition to determine the library of the structure-property relationship. (b) Illustration of MFM and C-AFM operations on the CSE samples. (c) Electric field-induced magnetization reversal on domains with the miscut angle from the [110] direction of 8.9° (upper panel) and 36.6° (lower panel), respectively. (d) Average magnetic phase of the domains after being subjected to 0 V–4 V – + 4 V voltage cycles, as a function of the miscut angle from the [110] direction. (e) Average reversible magnetic contrast phase change (RMCPC) upon being subjected to either + 4 V or −4 V stimuli, as a function of the miscut angle from the [110] direction. Reproduced with permission from Ref. 37 under the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).

Figure 4

Figure 5. Reversible modulation of magnetic domain properties in Pt/LFO/SRO devices. (a) The inverse spinel-structured LiFe5O8 unit cell. (b) Schematic of the measurement setup. After programming the Pt/LFO/SRO device (defined by the via structure), the MFM images were obtained without the bias voltage. (c) and (d) current-voltage characteristics of the Pt/LFO/SRO device showing consecutive and bistable resistive switching behaviors, respectively. (e) MFM images of an area with a dominant upward domain at different resistance states in (c). Scale bar: 200 nm. (f) MFM images of an area with apparent magnetization changes, measured at different resistance states in (d). Scale bar: 200 nm. Reproduced with permission from Ref. 24 (John Wiley and Sons, 2016).

Figure 5

Figure 6. (a) Mechanism of the resistive switching and magnetic modulation during the set process and (b) the current-voltage curve of the Pt/Zn0.95Co0.05O/Pt device. The oxygen vacancy-based conductive filament is highlighted by the vertical arrow in (a). Room-temperature magnetization hysteresis loops of the Pt/Zn0.95Co0.05O/Pt device at (c) HRS and (d) LRS. The (e) saturated magnetic moment (MS) and (f) coercive field (Hc) are modulated reversibly during the resistive switching process. Reproduced with permission from Ref. 25 (John Wiley and Sons, 2012).

Figure 6

Figure 7. (a) Schematic of the typical electrochemical cell showing reversible Li+ ion intercalation and de-intercalation with spinel iron ferrite γ-Fe2O3. (b) Magnetic hysteresis measured at different stages of lithiation: blue, green, and red symbols stand for the as-prepared γ-Fe2O3 sample, and the samples that are discharged down to 1.7 and 1.1 V, respectively. after reaching the desired discharge potential, the electrochemical cell has been electrically disconnected prior to the magnetic measurements. (c) Fully-reversible variation in magnetic response (measured at the magnetic field of 1 T) of the sample. The discharge and charge cycles are carried out with a potentiometric constant current pf 115 mA/g and cut-off potentials of 1.1 and 3.5 V versus Li+/Li during lithiation and delithiation steps, respectively. Reproduced with permission from Ref. 21 (John Wiley and Sons, 2014).

Figure 7

Figure 8. (a) Device schematic and (b) high-resolution cross-sectional transmission electron microscopic image of the Au/Ta/GdOx/Co/Pt/Ta multilayer structure for the electric field-controlled magnetic anisotropy. Polar magneto-optical Kerr (MOKE) hysteresis loops of the sample measured at room temperature at the centre of the gate electrode showing the device in its virgin state (c), after applying Vg = −4 V at 100 °C for (d) 1 s, (e) 150 s and (f) 230 s, and (g) after applying Vg = 4 V at 100 °C for 270 s. Note that the Kerr signal intensity in (e) is reduced by a factor of 2 and in (f) by a factor of 16, as indicated by inset number. Reproduced with permission from Ref. 22 (Springer Nature, 2014).

Figure 8

Figure 9. (a) Schematic of the multi-layered resistive switching Co/ZnO/Fe structures. (b) Evolutional formation of the Co conductive filament in the Co/ZnO/Fe structure under the positively biased voltage applied to the top cobalt electrode. The tunneling magnetoresistance (TMR) of the CoZnO/Fe structures measured in (c) State 1, (d) State 2, (e) State 3 and (f) State 4. Reproduced with permission from Ref. 28 (Institute of Physics (IOP), 2014).

Figure 9

Figure 10. (a) Schematics and cross-section of the crossbar Ni/TiO2/Pt device structure. (b) The typical current-voltage curve of the Ni/TiO2/Pt device showing unipolar resistive switching characteristics. Anisotropic characteristics of the LRS Ni/TiO2/Pt device with the external magnetic field applied in the directions of (c) Hx, (d) Hy and (e) Hz, respectively. (f) Scanning of the out-of-plane magnetic field direction with respect to the substrate surface and (g) the related room-temperature magnetoresistance of the Co /HfO2/Pt device as a function of the rotating angle. (a)–(e) are reproduced with permission from Ref. 29 (Springer Nature, 2014). (f) and (g) are reproduced with permission from Ref. 31 under the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).