Hostname: page-component-68c7f8b79f-7mrzp Total loading time: 0 Render date: 2025-12-28T02:13:12.271Z Has data issue: false hasContentIssue false
Accepted manuscript

1 kHz, 280 mJ, 14.5 ns High-power and High-energy 2.05-μm Laser Generation via a Three-stage Ho:YLF Rod Amplifier

Published online by Cambridge University Press:  07 November 2025

Yuchun Liu
Affiliation:
State Key Laboratory of Ultra-intense Laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China School of Physical Science and Technology, ShanghaiTech University, Shanghai 201210, China
Panqiang Kang
Affiliation:
State Key Laboratory of Ultra-intense Laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Enhao Li*
Affiliation:
State Key Laboratory of Ultra-intense Laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Weichao Yao
Affiliation:
State Key Laboratory of Ultra-intense Laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
Yujie Peng
Affiliation:
State Key Laboratory of Ultra-intense Laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China School of Physics and Optoelectronic Engineering, Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou 310024, China yjpeng@siom.ac.cn
Yuxin Leng
Affiliation:
State Key Laboratory of Ultra-intense Laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China School of Physical Science and Technology, ShanghaiTech University, Shanghai 201210, China School of Physics and Optoelectronic Engineering, Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou 310024, China lengyuxin@mail.siom.ac.cn
Zhizhan Xu
Affiliation:
State Key Laboratory of Ultra-intense Laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China School of Physical Science and Technology, ShanghaiTech University, Shanghai 201210, China
Rights & Permissions [Opens in a new window]

Abstract

Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'

Information

Type
Research Article
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (https://creativecommons.org/licenses/by/4.0/), which permits unrestricted re-use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright
© The Author(s), 2025. Published by Cambridge University Press in association with Chinese Laser Press

Footnotes

These authors contributed equally to this work