Hostname: page-component-89b8bd64d-b5k59 Total loading time: 0 Render date: 2026-05-08T00:44:39.454Z Has data issue: false hasContentIssue false

1 kHz, 280 mJ, 14.5 ns high-power and high-energy 2.05 μm laser generation via a three-stage Ho:YLF rod amplifier

Published online by Cambridge University Press:  07 November 2025

Yuchun Liu
Affiliation:
State Key Laboratory of Ultra-intense Laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , Shanghai, China School of Physical Science and Technology, ShanghaiTech University, Shanghai, China
Panqiang Kang
Affiliation:
State Key Laboratory of Ultra-intense Laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , Shanghai, China
Enhao Li*
Affiliation:
State Key Laboratory of Ultra-intense Laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , Shanghai, China
Weichao Yao
Affiliation:
State Key Laboratory of Ultra-intense Laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , Shanghai, China
Yujie Peng*
Affiliation:
State Key Laboratory of Ultra-intense Laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , Shanghai, China School of Physics and Optoelectronic Engineering, Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, China
Yuxin Leng*
Affiliation:
State Key Laboratory of Ultra-intense Laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , Shanghai, China School of Physical Science and Technology, ShanghaiTech University, Shanghai, China School of Physics and Optoelectronic Engineering, Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, China
Zhizhan Xu
Affiliation:
State Key Laboratory of Ultra-intense Laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , Shanghai, China School of Physical Science and Technology, ShanghaiTech University, Shanghai, China
*
Correspondence to: E. Li, Y. Peng and Y. Leng, State Key Laboratory of Ultra-intense Laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China. Emails: lienhao@siom.ac.cn (E. Li); yjpeng@siom.ac.cn (Y. Peng); lengyuxin@mail.siom.ac.cn (Y. Leng)
Correspondence to: E. Li, Y. Peng and Y. Leng, State Key Laboratory of Ultra-intense Laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China. Emails: lienhao@siom.ac.cn (E. Li); yjpeng@siom.ac.cn (Y. Peng); lengyuxin@mail.siom.ac.cn (Y. Leng)
Correspondence to: E. Li, Y. Peng and Y. Leng, State Key Laboratory of Ultra-intense Laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China. Emails: lienhao@siom.ac.cn (E. Li); yjpeng@siom.ac.cn (Y. Peng); lengyuxin@mail.siom.ac.cn (Y. Leng)

Abstract

A 2.05 μm holmium-doped yttrium lithium fluoride (Ho:YLF) master oscillator power amplifier system with both high average power and high pulse energy operating at a 1 kHz repetition rate is demonstrated, achieving a maximum output power of 280 W with a pulse width of 14.5 ns. The system comprises three-stage amplifiers, boosting a 20 W seed laser to output powers of 110, 205 and 280 W, corresponding to extraction efficiencies of 46.1%, 45.0% and 34.9%, respectively. At maximum output, the system exhibits excellent beam quality (Mx2 = 1.22 and My2 = 1.23) and power stability (root mean square = 0.5% over 30 min). To the best of our knowledge, this work reports the highest pulse energy (280 mJ) achieved for a 2 μm laser operating at a kHz repetition rate. In addition, a slice model of an end-pumped quasi-three-level laser amplifier was developed to analyze the output limitations of multi-stage Ho:YLF amplifiers based on rod geometry, providing theoretical support for the experimental results.

Information

Type
Research Article
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (https://creativecommons.org/licenses/by/4.0), which permits unrestricted re-use, distribution and reproduction, provided the original article is properly cited.
Copyright
© The Author(s), 2025. Published by Cambridge University Press in association with Chinese Laser Press
Figure 0

Figure 1 Experimental setup of the Ho:YLF MOPA system. M, reflector; DM, dichroic mirror. Inset: photograph of the water-immersed heat sink.

Figure 1

Figure 2 (a) Laser beam quality of the Ho:YLF oscillator at the output power of 20.5 W, (b) pulse train and (c) pulse profile. (d) Power stabilities of Tm:fiber pump lasers.

Figure 2

Figure 3 Output powers of the first-stage amplifier using the different combinations of Ho:YLF crystals with respect to the incident power of the Tm:fiber laser.

Figure 3

Figure 4 Laser beam quality of the first-stage amplifier with the utilization of (a) a 100 mm Ho:YLF crystal and (b) combination of 100 and 60 mm Ho:YLF crystals.

Figure 4

Figure 5 Laser performance of the second-stage amplifier: (a) output powers with respect to the incident pump powers; (b) measured laser beam quality after second-stage amplification.

Figure 5

Figure 6 Laser performance of the third-stage amplifier: (a) output powers with respect to the incident pump powers; (b) measured laser beam quality after third-stage amplification.

Figure 6

Figure 7 Maximum average output power of three amplifiers measured over 30 min.

Figure 7

Table 1 Comparison of state-of-the-art 2 μm Ho-doped MOPA systems.

Figure 8

Figure 8 (a) Slice model of the Ho:YLF rod amplifier. (b) Calculation logic in each slice of the crystal.

Figure 9

Table 2 Key parameters used in the slice amplifier model.

Figure 10

Figure 9 (a) Comparison of the simulated output powers and the experimental results of three-stage amplifiers. (b) Variation of simulated average power along two Ho:YLF crystals in the third-stage amplifier at the maximum output power.

Figure 11

Figure 10 Simulated maximum temperature and thermal stress of Ho:YLF in the third-stage amplifier as a function of incident pump power.

Figure 12

Table 3 Simulated output performance of multi-stage Ho:YLF rod amplifiers.

Figure 13

Figure 11 Simulated maximum output power, optical conversion efficiency and extraction efficiency for multi-stage Ho:YLF rod amplifiers.