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Nanoindentation of high-purity vapor deposited lithium films: The elastic modulus

Published online by Cambridge University Press:  25 May 2018

Erik G. Herbert*
Affiliation:
Department of Materials Science and Engineering, Michigan Technological University, Houghton, Michigan 49931, USA
Stephen A. Hackney
Affiliation:
Department of Materials Science and Engineering, Michigan Technological University, Houghton, Michigan 49931, USA
Nancy J. Dudney
Affiliation:
Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830, USA
P. Sudharshan Phani
Affiliation:
International Advanced Research Centre for Powder Metallurgy and New Materials, Hyderabad, Telangana–500005, India
*
a)Address all correspondence to this author. e-mail: eherbert@mtu.edu

Abstract

Nanoindentation has been used to measure the elastic modulus of 5 and 18 μm thick high-purity vapor deposited polycrystalline lithium films at 31 °C. Over indentation depths ranging from 150 to 1100 nm, the modulus is found to vary with film thickness from 9.8 GPa ± 11.9% to 8.2 GPa ± 14.5%. These results are well within the range of lithium's orientation dependent elastic modulus, which spans approximately 3.1 to 21.4 GPa. The measured values may also indicate (111) and (100) texture for the 5 and 18 μm thick films, respectively. The potential effects of pileup and surface contamination are found to be negligible if any at all. Small but discernible changes in damping capability near the free surface may provide insight into the subsurface defect structure and the potential for localized heating. Numerous experimental challenges are addressed and key metrics are used to validate the measured elastic modulus.

Information

Type
Invited Feature Paper
Copyright
Copyright © Materials Research Society 2018 
Figure 0

FIG. 1. The film (substrate corrected using the Hay–Crawford22 thin-film model) and apparent (measured) elastic modulus of a high-purity vapor deposited 5 μm thick Li film on a glass substrate (T = 31 °C).

Figure 1

FIG. 2. Approximately 1.1 μm deep residual hardness impressions in Li. The straight (rather than bowed outward) contact edges connecting the 3 corners and the absence of discernible changes in the surface morphology radiating outward from the contact indicate that there is no significant pile-up.

Figure 2

FIG. 3. The peak force amplitude of the harmonic oscillation normalized by the applied load.

Figure 3

FIG. 4. The elastic modulus of high-purity vapor deposited 5 and 18 μm thick Li films on glass substrates. The modulus was measured during the 60 s hold at 260 μN (corresponding depth of ∼1.1 μm). Data from the 5 μm thick film have been corrected for the substrate using the Hay–Crawford thin-film model. Data from the 18 μm thick film did not require a substrate correction.

Figure 4

FIG. 5. Comparisons between fused silica and two Li films, 5 and 18 μm thick on glass substrates: (a) the amplitude (rms) of the harmonic oscillation; (b) the relative change in contact area; and (c) the material’s ability to dissipate mechanical energy. Data in the gray regions were obtained during the 60 s hold at Pmax rather than during the loading segment.

Figure 5

FIG. 6. The elastic modulus of high-purity vapor deposited 5 and 18 μm thick Li films on glass substrates. At the higher targeted $\dot{P}{\rm{/}}P$ of 0.5 s−1, the decrease in E with depth (to h = 1 μm) is an experimental artifact due to the plasticity error, i.e., the contact area is changing significantly over the time scale of the measurement being made by the PLA.