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Surface flaws control strain localization in the deformation of Cu|Au nanolaminate pillars

Published online by Cambridge University Press:  10 July 2019

Adrien Gola
Affiliation:
Department of Microsystems Engineering, University of Freiburg, Georges-Köhler-Allee 103, 79110 Freiburg, Germany Institute for Applied Materials, Karlsruhe Institute of Technology (KIT), Straße am Forum 4, 76131 Karlsruhe, Germany
Guang-Ping Zhang
Affiliation:
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, 72 Wenhua Road, Shenyang 110016, P.R. China
Lars Pastewka*
Affiliation:
Department of Microsystems Engineering, University of Freiburg, Georges-Köhler-Allee 103, 79110 Freiburg, Germany Freiburg Materials Research Center, University of Freiburg, 79104 Freiburg, Germany
Ruth Schwaiger
Affiliation:
Institute for Applied Materials, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany
*
Address all correspondence to Lars Pastewka at lars.pastewka@imtek.uni-freiburg.de

Abstract

The authors carried out matched experiments and molecular dynamics simulations of the compression of nanopillars prepared from Cu|Au nanolaminates with up to 25 nm layer thickness. The stress–strain behaviors obtained from both techniques are in excellent agreement. Variation in the layer thickness reveals an increase in the strength with a decreasing layer thickness. Pillars fail through the formation of shear bands whose nucleation they trace back to the existence of surface flaws. This combined approach demonstrates the crucial role of contact geometry in controlling the deformation mode and suggests that modulus-matched nanolaminates should be able to suppress strain localization while maintaining controllable strength.

Information

Type
Research Letters
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted re-use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright
Copyright © The Author(s) 2019
Figure 0

Figure 1. SEM images of deformation and failure during the compression of a nanolaminate pillar comprised of 40 layers of λ = 25 nm thickness. (a) Prior to deformation. (b) The deformation localizes at the top of the pillar and (c) forms a step on the top half (d) followed by failure through an interlayer shear band.

Figure 1

Figure 2. (a) Side view of our atomistic pillar models with layer thickness of λ = 25, 10, and 5 nm. Atoms are color-coded according to their type with Cu atoms in blue and Au atoms in red. The thin layer of yellow/gray atoms at the bottom are a rigid substrate of Au atoms. (b) Top view of the pillar model with λ = 5 nm showing a realization of random surface roughness. Atoms are colored after their position along the [111] crystallographic direction that is normal to the interfaces. (c) Cross section at one-fifth of the pillar height during compression used to compute the cross-sectional area from the MD calculations. Red- and green-dashed lines show the longest and shortest half-axes of the cross section.

Figure 2

Figure 3. Stress–strain response during pillar compression obtained in experiments and through MD simulations for a different layer thickness λ. The lateral true strain and the area required to compute σ are determined from reference cross sections at one-fifth of the pillar height from the top of the pillar in all cases. The error bars of the simulated data are obtained by repeating the area measurement at distances ±1 nm of the reference cross section.

Figure 3

Figure 4. Comparison of the deformation mechanism for (a) an atomically flat nanopillar, (b) nanopillars with an atomic step at the surface, and (c, e, and f) nanopillars with random roughness on the top with a rms slope of 0.1. (d) Au nanopillar with a 1° tilted indenter leading to a stress concentration at the pillar edge. The top row in (a–c) corresponds to the undeformed stage of the systems, while the bottom row corresponds to the systems after the normal compressive strain of 0.2. The layer thickness ranges from 5 nm (a–c) to 10 nm (e) and 25 nm (f). The indenter has been removed for clarity for the multilayer systems. Atoms are color-coded after their type, Cu are in blue, Au are in red, and fixed atoms are in yellow. Arrow in (b) shows the initial position of the step at the surface. Arrows in (e and f) show the location of the initial formation of shear bands. Surfaces with self-affine random roughness (see text) are labelled with “rnd”.

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