Hostname: page-component-89b8bd64d-nlwjb Total loading time: 0 Render date: 2026-05-09T04:56:02.982Z Has data issue: false hasContentIssue false

Atomic layer deposition of cubic tin–calcium sulfide alloy films

Published online by Cambridge University Press:  22 November 2019

Chuanxi Yang
Affiliation:
Department of Chemistry, Harvard University, Cambridge, Massachusetts 02138, USA
Xizhu Zhao
Affiliation:
Department of Chemistry, Harvard University, Cambridge, Massachusetts 02138, USA
Sang Bok Kim
Affiliation:
Department of Chemistry, Harvard University, Cambridge, Massachusetts 02138, USA
Laura T. Schelhas
Affiliation:
Stanford Synchrotron Radiation Lightsource, SLAC National Accelerator Laboratory, Menlo Park, California 94025, USA
Xiabing Lou
Affiliation:
Department of Chemistry, Harvard University, Cambridge, Massachusetts 02138, USA
Roy G. Gordon*
Affiliation:
Department of Chemistry, Harvard University, Cambridge, Massachusetts 02138, USA
*
a)Address all correspondence to this author. e-mail: gordon@chemistry.harvard.edu

Abstract

We deposit films of tin–calcium sulfide by atomic layer deposition (ALD) and demonstrate the metastability of this material. Rough and spiky films are obtained by using Sn and Ca precursors with different ligands, whereas compact and smooth films are obtained when the two metal sources share the same ligands. Compositional and quartz crystal microbalance results indicate that part of the underlaying SnS film is replaced and/or removed during the CaS ALD cycle during the ternary film deposition, possibly via a temperature-dependent cation exchange mechanism. The crystal structure transforms from orthorhombic to cubic as the calcium content increases. Furthermore, resistivity increases with calcium content in the alloy films, whereas optical band gap only depends weakly on Ca content. After annealing at 400 °C in an H2S environment, the cubic alloy film undergoes a phase transition into the orthorhombic phase and its resistivity also decreases. Both phenomena could be explained by phase separation of the metastable alloy.

Information

Type
Article
Copyright
Copyright © Materials Research Society 2019
Figure 0

Figure 1: Cross-sectional SEM of (Sn,Ca)S deposited by Ca(F-amd)2 and Sn(A-amd)2 at different substrate temperatures: (a) 160 °C, (b) 190 °C, (c) 212 °C, and (d) 245 °C.

Figure 1

Figure 2: Composition at different locations in the hot-wall tube ALD reactor of the (Sn,Ca)S film deposited at different temperatures. (a) Schematic diagram sample location across the 12 in substrate holder inside an approximately 18 in long hot-wall tube reactor - sample 1 is closest to the precursors inlet and sample 8 is closest to outlet to a roughing pump. (b) Atomic ratio of Ca/(Ca + Sn) estimated by XPS.

Figure 2

Figure 3: Composition of (Sn,Ca)S deposited by Ca(F-amd)2 and Sn(A-amd)2 (a) at different temperatures using SnS:CaS dosing ratio of 20:1 and (b) using SnS:CaS dosing ratio ranging from 5:1 to 35:1 at substrate temperature of 212 °C. The blue square represents experimentally observed value, and the black dot represents the calculated value under the ideal mixture assumption.

Figure 3

Figure 4: (a) Mass changes as measured by QCM during (Sn,Ca)S deposition using SnS:CaS dose ratio of 15:1. (b) Comparison of mass change in one CaS ALD cycle in a bulk CaS film (blue) and in the alloy deposition (red).

Figure 4

Figure 5: (a)–(c) Cross-section (top) and top-view (bottom) SEM of 100–200 nm of (Sn,Ca)S ternary films deposited by Sn(F-amd)2 and Ca(F-amd)2 at different temperatures using an SnS:CaS ALD cycle ratio of 15:1. The growth rates are estimated to be 6.3, 5.7, and 4.7A per super cycle. Cycle numbers are chosen so that the film thickness is 100–200 nm. (d) Cross-section SEM of an attempted solar cell with a 500-nm (Sn,Ca)S film deposited at 190 °C. In this structure, (Sn,Ca)S film was sandwiched between Mo growth substrate and sputtered ITO. (e)–(h) Cross-section (top) and top-view (bottom) SEM of 100–200 nm of (Sn,Ca)S films deposited at 160 °C using different ALD cycle ratios of SnS:CaS. Growth rates are in the rage of 4.6 to 6.8 A per super cycle.

Figure 5

Figure 6: Composition of (Sn,Ca)S deposited by Ca(F-amd)2 and Sn(F-amd)2 (a) at different temperatures using SnS:CaS dosing ratio of 20:1 and (b) using SnS:CaS dosing ratio ranging from 10:1 to 30:1 at substrate temperature of 212 °C. The blue square represents experimentally observed value, and the black dot represents the calculated value under the ideal mixture assumption.

Figure 6

Figure 7: XRD spectra of (a) as-deposit and (b) annealed thin films (∼100 nm) with different Ca contents. The y-axis represents the percentage of Ca in the cation mix of Sn + Ca, and the bottom spectrum represents pure SnS. (c) Synchrotron-based 2DXRD integrated spectra of thicker film (∼600 nm) with Ca/(Ca + Sn) = 0.33. The peaks corresponding to different crystal structures are labeled by different markers. The light-colored dashed lines mean to serve as a guide to the eye.

Figure 7

Figure 8: (a) Resistivity of (Sn,Ca)S samples with different Ca content deposited at 160 and 135 °C, as-deposit (solid) and after annealing (unfilled). (b) Van der Pauw and Hall measurements of 600 nm of Sn0.67Ca0.33S deposited at 135 °C and after annealing at 400 °C in H2S environment for 1 and 2 h.

Supplementary material: File

Yang et al. supplementary material

Yang et al. supplementary material 1

Download Yang et al. supplementary material(File)
File 73.7 KB
Supplementary material: Image

Yang et al. supplementary material

Yang et al. supplementary material 2

Download Yang et al. supplementary material(Image)
Image 262 KB