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The influence of space environmental factors on the laser-induced damage thresholds in optical components

Published online by Cambridge University Press:  03 June 2024

Bin Ma*
Affiliation:
Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai, China MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University, Shanghai, China Shanghai Frontiers Science Center of Digital Optics, Tongji University, Shanghai, China Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University, Shanghai, China
Shuang Guan
Affiliation:
Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai, China MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University, Shanghai, China
Dongyue Yan
Affiliation:
Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai, China MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University, Shanghai, China
Qiaofei Pan
Affiliation:
Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai, China MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University, Shanghai, China
Zhiqiang Hou
Affiliation:
Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai, China MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University, Shanghai, China
Ke Wang
Affiliation:
Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai, China MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University, Shanghai, China
Jiaqi Han
Affiliation:
Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai, China MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University, Shanghai, China
*
Correspondence to: B. Ma, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China. Email: mabin@tongji.edu.cn

Abstract

This paper systematically investigated the impact mechanisms of proton irradiation, atomic oxygen irradiation and space debris collision, both individually and in combination, on the laser damage threshold and damage evolution characteristics of HfO2/SiO2 triple-band high-reflection films and fused silica substrates using a simulated near-Earth space radiation experimental system. For the high-reflection film samples, the damage thresholds decreased by 15.38%, 13.12% and 46.80% after proton, atomic oxygen and simulated space debris (penetration) irradiation, respectively. The coupling irradiation of the first two factors resulted in a decrease of 26.93%, while the combined effect of all the three factors led to a reduction of 63.19%. Similarly, the fused silica substrates exhibited the same pattern of laser damage performance degradation. Notably, the study employed high-precision fixed-point in situ measurement techniques to track in detail the microstructural changes, surface roughness and optical-thermal absorption intensity before and after proton and atomic oxygen irradiation at the same location, thus providing a more accurate and comprehensive analysis of the damage mechanisms. In addition, simulations were conducted to quantitatively analyze the transmission trajectories and concentration distribution lines of protons and atomic oxygen incident at specific angles into the target material. The research findings contribute to elucidating the laser damage performance degradation mechanism of transmissive elements in near-Earth space environments and provide technical support for the development of high-damage-threshold optical components resistant to space radiation.

Information

Type
Research Article
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (https://creativecommons.org/licenses/by/4.0), which permits unrestricted re-use, distribution and reproduction, provided the original article is properly cited.
Copyright
© The Author(s), 2024. Published by Cambridge University Press in association with Chinese Laser Press
Figure 0

Figure 1 Simulated impacts from different types of microscopic fragments: (a) penetration holes, (b) compression-induced cracking and (c) cratering.

Figure 1

Figure 2 Damage condition of high-reflectance thin film (one series) and substrate (two series) samples: (a) initial damage morphology; (b) damage to the membrane around the hole; (c) bright spots appearing around the hole; (d) extensive damage centered around the hole.

Figure 2

Figure 3 LIDT results for different states in 30 μm substrates and high-reflection films (1, initial damage morphology; 2, damage to the membrane around the hole; 3, bright spots appearing around the hole; 4, extensive damage centered around the hole).

Figure 3

Figure 4 A comparison of LIDTs for high-reflection films under the action of single space environmental factors (‘Without’ represents being without any space environmental factors).

Figure 4

Figure 5 A comparison of LIDTs for substrates under the action of single space environmental factors (‘Without’ represents being without any space environmental factors).

Figure 5

Figure 6 A comparison of LIDT values produced by the coupled effect of atomic oxygen and protons.

Figure 6

Table 1 A comparison of LIDT reductions for different modes of action.

Figure 7

Figure 7 A comparison of LIDT values for simulated fragment compressions in (a) high-reflectance films and (b) substrates. A, protons and atomic oxygen; B, protons and penetration; C, atomic oxygen and penetration; D, protons and atomic oxygen and penetration.

Figure 8

Table 2 A comparison of LIDT reductions for different combinations of three space environmental factors.

Figure 9

Figure 8 Surface morphology images of three-band high-reflectance thin films before and after proton and atomic oxygen irradiation: (a) before proton irradiation; (b) after proton irradiation; (c) before atomic oxygen irradiation; (d) after atomic oxygen irradiation.

Figure 10

Table 3 Test results for weak absorption corresponding to three operating wavelengths[39].

Figure 11

Figure 9 SRIM simulations of proton concentrations and atomic oxygen distributions within the membrane layer: (a) protons; (b) atomic oxygen.