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Thin-disk multi-pass amplifier for kilowatt-class ultrafast lasers

Published online by Cambridge University Press:  16 October 2024

Sizhi Xu
Affiliation:
Key Laboratory of Advanced Optical Precision Manufacturing Technology of Guangdong Higher Education Institutes, Sino-German College of Intelligent Manufacturing, Shenzhen Technology University, Shenzhen, China
Xing Liu*
Affiliation:
Key Laboratory of Advanced Optical Precision Manufacturing Technology of Guangdong Higher Education Institutes, Sino-German College of Intelligent Manufacturing, Shenzhen Technology University, Shenzhen, China
Yubo Gao
Affiliation:
Key Laboratory of Advanced Optical Precision Manufacturing Technology of Guangdong Higher Education Institutes, Sino-German College of Intelligent Manufacturing, Shenzhen Technology University, Shenzhen, China
Zuoyuan Ou
Affiliation:
Key Laboratory of Advanced Optical Precision Manufacturing Technology of Guangdong Higher Education Institutes, Sino-German College of Intelligent Manufacturing, Shenzhen Technology University, Shenzhen, China
Fayyaz Javed
Affiliation:
Key Laboratory of Advanced Optical Precision Manufacturing Technology of Guangdong Higher Education Institutes, Sino-German College of Intelligent Manufacturing, Shenzhen Technology University, Shenzhen, China
Xingyu He
Affiliation:
Key Laboratory of Advanced Optical Precision Manufacturing Technology of Guangdong Higher Education Institutes, Sino-German College of Intelligent Manufacturing, Shenzhen Technology University, Shenzhen, China
Haotian Lu
Affiliation:
Key Laboratory of Advanced Optical Precision Manufacturing Technology of Guangdong Higher Education Institutes, Sino-German College of Intelligent Manufacturing, Shenzhen Technology University, Shenzhen, China
Junzhan Chen
Affiliation:
Key Laboratory of Advanced Optical Precision Manufacturing Technology of Guangdong Higher Education Institutes, Sino-German College of Intelligent Manufacturing, Shenzhen Technology University, Shenzhen, China
Yewang Chen
Affiliation:
Key Laboratory of Advanced Optical Precision Manufacturing Technology of Guangdong Higher Education Institutes, Sino-German College of Intelligent Manufacturing, Shenzhen Technology University, Shenzhen, China
Deqin Ouyang
Affiliation:
Key Laboratory of Advanced Optical Precision Manufacturing Technology of Guangdong Higher Education Institutes, Sino-German College of Intelligent Manufacturing, Shenzhen Technology University, Shenzhen, China
Junqing Zhao
Affiliation:
Key Laboratory of Advanced Optical Precision Manufacturing Technology of Guangdong Higher Education Institutes, Sino-German College of Intelligent Manufacturing, Shenzhen Technology University, Shenzhen, China
Xu Wu
Affiliation:
Key Laboratory of Advanced Optical Precision Manufacturing Technology of Guangdong Higher Education Institutes, Sino-German College of Intelligent Manufacturing, Shenzhen Technology University, Shenzhen, China
Chunyu Guo
Affiliation:
Shenzhen Key Laboratory of Laser Engineering, Guangdong Provincial Key Laboratory of Micro/Nano Optomechatronics Engineering, Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen, China
Cangtao Zhou
Affiliation:
Shenzhen Key Laboratory of Ultraintense Laser and Advanced Material Technology, College of Engineering Physics, Shenzhen Technology University, Shenzhen, China
Qitao Lue
Affiliation:
Han’s Laser Technology Industry Group Co., Ltd., Shenzhen, China
Shuangchen Ruan*
Affiliation:
Key Laboratory of Advanced Optical Precision Manufacturing Technology of Guangdong Higher Education Institutes, Sino-German College of Intelligent Manufacturing, Shenzhen Technology University, Shenzhen, China
*
Correspondence to: X. Liu and S. Ruan, Key Laboratory of Advanced Optical Precision Manufacturing Technology of Guangdong Higher Education Institutes, Sino-German College of Intelligent Manufacturing, Shenzhen Technology University, Shenzhen 518118, China. Emails: liuxing@sztu.edu.cn (X. Liu); scruan@sztu.edu.cn (S. Ruan)
Correspondence to: X. Liu and S. Ruan, Key Laboratory of Advanced Optical Precision Manufacturing Technology of Guangdong Higher Education Institutes, Sino-German College of Intelligent Manufacturing, Shenzhen Technology University, Shenzhen 518118, China. Emails: liuxing@sztu.edu.cn (X. Liu); scruan@sztu.edu.cn (S. Ruan)

Abstract

We report on an improved ytterbium-doped yttrium aluminum garnet thin-disk multi-pass amplifier for kilowatt-level ultrafast lasers, showcasing excellent beam quality. At a repetition rate of 800 kHz, the 6.8 ps, 276 W seed laser is amplified up to an average power of 1075 W, corresponding to a pulse energy of 1.34 mJ. The 36-pass amplifier is designed as a compact mirror array in which the beam alternately propagates between the mirrors and the disk by a quasi-collimated state. We adopted a quasi-collimated propagation to confine stray and diffracted light by the slight curvature of the disk, which enables us to achieve an outstanding extraction efficiency of up to 57% with excellent beam quality in stable laser operation at high power. The beam quality at 1075 W was measured to be M2 < 1.51. Furthermore, stability testing was demonstrated with a root-mean-square power fluctuation of less than 1.67% for 10 min.

Information

Type
Research Article
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (https://creativecommons.org/licenses/by/4.0), which permits unrestricted re-use, distribution and reproduction, provided the original article is properly cited.
Copyright
© The Author(s), 2024. Published by Cambridge University Press in association with Chinese Laser Press
Figure 0

Figure 1 Experimental setup of the amplifier system.

Figure 1

Figure 2 Evolution of the beam diameter during propagation within the TDMPA.

Figure 2

Figure 3 Average output power and extraction efficiency of the TDMPA as a function of the pump power.

Figure 3

Figure 4 (a) Pulse widths and (b) optical spectra of the pulses at the maximum output power for the seed laser and TDMPA.

Figure 4

Figure 5 (a) Beam quality measurement at 1.075 kW of average output power. (b) Power stability at 1.054 kW.