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Solute stabilization of nanocrystalline tungsten against abnormal grain growth

Published online by Cambridge University Press:  05 September 2017

Olivia K. Donaldson
Affiliation:
Department of Materials Science and Engineering, Stony Brook University, Stony Brook, New York 11794, USA
Khalid Hattar
Affiliation:
Department of Radiation Solid Interactions, Sandia National Laboratories, Albuquerque, New Mexico 87185, USA
Tyler Kaub
Affiliation:
Department of Metallurgical and Materials Engineering, University of Alabama, Tuscaloosa, Alabama 35487, USA
Gregory B. Thompson
Affiliation:
Department of Metallurgical and Materials Engineering, University of Alabama, Tuscaloosa, Alabama 35487, USA
Jason R. Trelewicz*
Affiliation:
Department of Materials Science and Engineering, Stony Brook University, Stony Brook, New York 11794, USA
*
a) Address all correspondence to this author. e-mail: jason.trelewicz@stonybrook.edu

Abstract

Microstructure and phase evolution in magnetron sputtered nanocrystalline tungsten and tungsten alloy thin films are explored through in situ TEM annealing experiments at temperatures up to 1000 °C. Grain growth in unalloyed nanocrystalline tungsten transpires through a discontinuous process at temperatures up to 550 °C, which is coupled to an allotropic phase transformation of metastable β-tungsten with the A-15 cubic structure to stable body centered cubic (BCC) α-tungsten. Complete transformation to the BCC α-phase is accompanied by the convergence to a unimodal nanocrystalline structure at 650 °C, signaling a transition to continuous grain growth. Alloy films synthesized with compositions of W–20 at.% Ti and W–15 at.% Cr exhibit only the BCC α-phase in the as-deposited state, which indicate the addition of solute stabilizes the films against the formation of metastable β-tungsten. Thermal stability of the alloy films is significantly improved over their unalloyed counterpart up to 1000 °C, and grain coarsening occurs solely through a continuous growth process. The contrasting thermal stability between W–Ti and W–Cr is attributed to different grain boundary segregation states, thus demonstrating the critical role of grain boundary chemistry in the design of solute-stabilized nanocrystalline alloys.

Information

Type
Early Career Scholars in Materials Science 2018: Invited Feature Paper
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted re-use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright
Copyright © Materials Research Society 2017
Figure 0

FIG. 1. (a) Bright-field TEM image of the as-deposited nanocrystalline tungsten film with the selected area diffraction pattern shown in the inset, (b) corresponding grain size distribution with a mean grain size of approximately 10 nm, and (c) integrated radial intensity profile determined from the inset in (a) revealing a two-phase structure composed primarily of metastable β-tungsten and BCC α-tungsten appearing at higher Bragg angles.

Figure 1

FIG. 2. Bright-field images of the nanocrystalline tungsten films at (a) 300 °C, (b) 450 °C, (c) 550 °C and (d) 650 °C. The as-deposited unimodal nanocrystalline structure evolved to a bimodal distribution of grain sizes at the intermediate annealing temperatures, ultimately converging back to a unimodal grain structure at 650 °C.

Figure 2

FIG. 3. (a) Grain size distributions for the annealed tungsten films delineated for the bimodal grain size distributions at intermediate annealing temperatures and unimodal nanocrystalline structure at 650 °C. Normalized grain size as a function of the initial grain size for the tracking of individual grains over the temperature ranges of (b) 300–450 °C and (c) 450–650 °C. The size of the outlined grains remained consistent for the temperature range in (b) whereas curvature-driven grain growth transpired over the higher temperature range in (c).

Figure 3

FIG. 4. Integrated radial intensity profiles acquired at temperatures of (a) 300 °C and (b) 550 °C on the bimodal nanocrystalline structures during abnormal grain growth and at (c) 650 °C upon convergence to a unimodal nanocrystalline structure. The α–β two-phase tungsten film evolved to single-phase BCC α-tungsten through an allotropic phase transformation.

Figure 4

FIG. 5. Precession electron diffraction orientation maps (upper) and combined reliability-orientation maps (lower) at (a) 300 °C, (b) 450 °C, and (c) 650 °C. Grains are colored according to the IPFs in Fig. 6, and the black regions in the reliability-orientation maps capture the low reliability index for grains ≤10 nm in size within the smaller grain size nanocrystalline matrix. The reader is referred to the web version of this article for interpretation of references to color.

Figure 5

FIG. 6. Inverse pole figures for the combined reliability-orientation maps in Fig. 5 at (a) 300 °C, (b) 450 °C, and (c) 650 °C. Each point corresponds to the orientation of an individual grain and employs an identical coloring scheme. A random polycrystalline texture was apparent across all temperatures indicating that no preferential orientations emerged during the abnormal or continuous growth regimes. The reader is referred to the web version of this article for interpretation of references to color.

Figure 6

FIG. 7. Bright-field images and selected area diffraction patterns for the nanocrystalline tungsten alloy thin films including (a) as-deposited W–20 at.% Ti, (b) 1000 °C annealed W–20 at.% Ti, (c) as-deposited W–15 at.% Cr, and (d) 1000 °C annealed W–15 at.% Cr.

Figure 7

FIG. 8. Grain size distributions for the W–20 at.% Ti and W–15 at.% Cr alloys in the as-deposited state (upper) and following heat treatment at 1000 °C (lower). A shift to larger nanocrystalline grain sizes was apparent in the W–Cr alloy and indicative of grain growth whereas the W–Ti alloy exhibited little change in the overall grain size distribution.

Figure 8

FIG. 9. Integrated radial intensity profiles from the selected area electron diffraction patterns in Fig. 7 for (a) as-deposited W–20 at.% Ti, (b) 1000 °C annealed W–20 at.% Ti, (c) as-deposited W–15 at.% Cr, and (d) 1000 °C annealed W–15 at.% Cr. The emergence of Ti and Cr peaks in (b) and (d), respectively, indicated that solute-rich second-phases formed upon annealing at 1000 °C.

Figure 9

FIG. 10. HAADF images and EELS maps for the W–20 at.% Ti film in the (a) as-deposited and (b) 1000 °C annealed conditions. The EELS maps correspond to the outlined region in the HAADF image in (a) and from the entire image in (b). The as-deposited films exhibited subtle grain boundary segregation, which became more pronounced following heat treatment.

Figure 10

FIG. 11. HAADF images and EELS maps for W–15 at.% Cr film in the (a) as-deposited and (b) 1000 °C annealed conditions. The EELS maps were produced from the entire HAADF images. The as-deposited films exhibited subtle grain boundary segregation whereas Cr-rich regions were detected upon annealing.