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Nanoindentation of high-purity vapor deposited lithium films: A mechanistic rationalization of the transition from diffusion to dislocation-mediated flow

Published online by Cambridge University Press:  25 May 2018

Erik G. Herbert*
Affiliation:
Department of Materials Science and Engineering, Michigan Technological University, Houghton, Michigan 49931, USA
Stephen A. Hackney
Affiliation:
Department of Materials Science and Engineering, Michigan Technological University, Houghton, Michigan 49931, USA
Violet Thole
Affiliation:
Department of Materials Science and Engineering, Michigan Technological University, Houghton, Michigan 49931, USA
Nancy J. Dudney
Affiliation:
Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830, USA
P. Sudharshan Phani
Affiliation:
International Advanced Research Centre for Powder Metallurgy and New Materials, Hyderabad, Telangana–500005, India
*
a)Address all correspondence to this author. e-mail: eherbert@mtu.edu

Abstract

Nanoindentation experiments performed in high-purity vapor deposited lithium films at 31 °C reveal a strain rate and length scale dependence in the stress at which pop-in type events signal an abrupt transition from diffusion to dislocation-mediated flow. The stress level at which the transition to dislocation-mediated flow occurs varies with the strain rate and ranges from 88 to 208 times larger than the nominal yield strength of bulk, polycrystalline lithium. Variation in the indentation strain rate reveals the relationship between the stress required to initiate the transition and the length scale at which the transition occurs follows the power-law relation, hardness × depth1.17 = 1.545 N/m0.83, where the magnitude of the exponent and constant reflect the defect structure of the film. A rationalization of the transition is provided through direct comparisons between the measured cumulative distribution function (CDF) and the CDF hypothesized for the activation of a Frank–Read source.

Information

Type
Invited Feature Paper
Copyright
Copyright © Materials Research Society 2018 
Figure 0

FIG. 1. The hardness of a 5 μm thick high-purity vapor deposited Li film on a glass substrate. Measured at TH = 0.67 and a targeted $\dot{P}{\rm{/}}P$ of 0.05 s−1. Averaged results (triangular data points) and 6 of 56 individual curves that illustrate the abrupt transition from diffusion to dislocation-mediated flow.

Figure 1

FIG. 2. High-purity vapor deposited Li. Power-law dependence between the average indentation pressure and depth at which the transition from diffusion to dislocation-mediated flow occurs.

Figure 2

FIG. 3. Experimentally measured CDFs of the indentation pressure (stress) at the sudden transition from diffusion to dislocation-mediated flow.

Figure 3

TABLE I. Values of β and λLave3 used to calculate the CDF of the transition stress as per Eq. (5) and the experimentally measured Weibull mean value, $\bar{H}h$.

Figure 4

FIG. 4. CDFs of the indentation pressure (stress) at the sudden transition from diffusion to dislocation-mediated flow: Direct comparisons between the experimentally measured CDFs and rationalizations based on the activation of a Frank–Reed source at the transition stress.

Figure 5

FIG. 5. Optical micrograph of ∼220 nm deep indents in a high-purity vapor deposited 18 μm thick Li film on a glass substrate: 28 indents in the interior of the grain and 68 indents in close proximity to the grain boundary.

Figure 6

FIG. 6. Direct comparison between the experimentally measured CDFs of the indentation pressure (stress) at the sudden transition from diffusion to dislocation-mediated flow in the grain interior versus close proximity to the grain boundary. This result clearly indicates that the grain boundary acts as a dislocation source.