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Photon management for photovoltaics

Published online by Cambridge University Press:  10 June 2011

E.T. Yu
Affiliation:
University of Texas at Austin, TX 78758, USA; ety@ece.utexas.edu
J. van de Lagemaat
Affiliation:
National Renewable Energy Laboratory, Golden, CO 80401, USA; jao.vandelagemaat@nrel.gov

Abstract

Photovoltaics are expected to play an important role in the future energy infrastructure. However, achieving simultaneously high efficiency in both light absorption and carrier collection remains a challenging tradeoff. Photon management, which refers to the engineering of materials and device structures to control the spatial distribution of optical energy, offers a number of promising routes to optimizing this tradeoff. Progress in fabrication of nanostructured materials combined with advances in the understanding of nanophotonic devices has enabled new strategies for photon management in a range of photovoltaic devices. Prominent among these are structures with pronounced surface topography or graded refractive-index profiles that reduce surface reflectivity; materials processing that increases optical absorption in materials such as silicon; incorporation of semiconductor nanostructures that enables simultaneous improvements in optical absorption and photogenerated carrier collection; and coherent light trapping in optical waveguide modes via plasmonic or optical scattering effects. The articles in this issue review some of these emerging directions.

Information

Type
Introduction
Copyright
Copyright © Materials Research Society 2011
Figure 0

Figure 1. Reducing light reflection in photovoltaics. (a) At a planar interface between air (or glass) and a typical semiconductor photovoltaic material, a substantial fraction of incident light, represented by photons labeled hν, is reflected due to the large mismatch in refractive index at the interface. (b) A dielectric film with appropriately chosen thickness and refractive index can eliminate reflection of light at a selected wavelength (for normally incident light) and reduce reflection over a broad range of wavelengths. (c) A dielectric film with a continuous or stepwise grading in refractive index—close to that of air or glass, as appropriate, at the top interface and approaching that of the underlying semiconductor material at the bottom—can act as a highly effective antireflection coating over the broad range of wavelengths and incident angles of light required for photovoltaic applications.

Figure 1

Figure 2. Trapping light in a photovoltaic device. (a) For bulk semiconductor photovoltaic devices (e.g., mono- or polycrystalline silicon), traditional surface texturing provides improved collection and trapping of light in the device, as surface topography enables incident light to undergo multiple reflections with increased total probability of transmission into the device. Deposition of an antireflection coating, as in Figure 1b, on the textured surface can further improve light collection and trapping efficiency. The optical path length for light in the device is also increased, which can result in improved optical absorption efficiency as well. (b) Submicron-scale surface texturing, as in laser-processed “black” silicon, can also be highly effective in light trapping for photovoltaics. (c) Nanowire-based photovoltaic device structures that consist of subwavelength-scale arrays of wires can trap light through a combination of multiple-reflection and near-field optical effects.

Figure 2

Figure 3. For thin-film photovoltaic devices, micrometer-scale texturing is typically challenging, and alternate approaches for light trapping have emerged. (a) Metal and/or dielectric nanostructures on the device surface can scatter incident light into optical modes, labeled k1 and k2 in the figure, confined within the thin-film semiconductor device structure. Such scattering can provide photons with dramatically increased path lengths within the device and corresponding increases in optical absorption efficiency. (b) Scattering of light into waveguide modes within a thin-film device can also be accomplished with scattering structures on the back side of the device. This geometry allows scattering to be optimized for longer-wavelength light, for which optical absorption coefficients are typically lower, and enables integration of an antireflection coating on the top surface, as illustrated in the figure.