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Grain boundary relaxation strengthening of nanocrystalline Ni–W alloys

Published online by Cambridge University Press:  14 March 2012

Timothy J. Rupert*
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139; and Department of Mechanical and Aerospace Engineering, University of California, Irvine, California 92697
Jason R. Trelewicz
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
Christopher A. Schuh
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
*
a)Address all correspondence to this author. e-mail: trupert@uci.edu

Abstract

The hardening effect caused by the relaxation of nonequilibrium grain boundary structure has been explored in nanocrystalline Ni–W alloys. First, the kinetics of relaxation hardening are studied, showing that higher annealing temperatures result in faster, more pronounced strengthening. Based on the temperature dependence of relaxation strengthening kinetics, triple junction diffusion is suggested as a plausible kinetic rate limiter for the removal of excess grain boundary defects in these materials. Second, the magnitude of relaxation strengthening is explored over a wide range of grain sizes spanning the Hall–Petch breakdown, with an apparent maximum hardening effect found at a grain size below 10 nm. The apparent activation volume for plastic deformation is unaffected by annealing for grain sizes down to ∼10 nm, but increases with annealing for the finest grain sizes, suggesting a change in the dominant deformation mechanism for these structures.

Information

Type
Articles
Copyright
Copyright © Materials Research Society 2012
Figure 0

FIG. 1. Transmission electron microscopy images showing the grain structure of nanocrystalline Ni–W in the (a) as-deposited state and (b) after annealing for 60 min at 300 °C. The grain size is found to be ∼12 nm in both cases, and no obvious structural changes are observed after annealing.

Figure 1

FIG. 2. Vickers hardness versus annealing time for grain sizes of 3 and 12 nm at annealing temperatures of (a) 150 °C, (b) 225 °C, and (c) 300 °C. For both grain sizes and all annealing temperatures, hardness is observed to first increase linearly with time, followed by a plateau. The magnitude of the hardness plateau increases with increasing annealing temperature.

Figure 2

TABLE I. Kinetic parameters for grain boundary relaxation hardening in nanocrystalline Ni–W.

Figure 3

FIG. 3. An Arrhenius plot showing the natural logarithm of the hardening rate [Eq. (2)] as a function of the inverse temperature. From this data, activation energies for relaxation hardening of the d = 3 nm and d = 12 nm specimens are calculated to be 54 ± 8 kJ/mol and 50 ± 9 kJ/mol, respectively.

Figure 4

FIG. 4. An Arrhenius plot showing the natural logarithm of the maximum change in hardness [Eq. (4)] as a function of the inverse temperature. From this data, characteristic energies for the plateau in relaxation hardening of the d = 3 nm and d = 12 nm specimens are calculated to be 6 ± 3 kJ/mol and 5 ± 1 kJ/mol, respectively.

Figure 5

TABLE II. Fitting parameters for magnitude of hardening plateau in nanocrystalline Ni–W.

Figure 6

FIG. 5. (a) Nanoindentation hardness of nanocrystalline Ni–W plotted as a function of grain size for as-deposited specimens, specimens annealed for 24 h at 150 °C, and specimens annealed for 24 h at 300 °C. (b) The difference between the hardness of the as-deposited state and the hardness after annealing for 24 h at 300 °C (ΔH), showing that relaxation hardening is most pronounced at a grain size of ∼6 nm.

Figure 7

FIG. 6. Hardness as a function of strain rate for as-deposited and annealed specimens with grain sizes from 3 to 75 nm. This data is used to calculate the activation volumes presented in Fig. 7.

Figure 8

FIG. 7. Activation volumes for both as-deposited and annealed Ni–W specimens, plotted as a function of grain size. For grain sizes down to ∼10 nm, annealing does not change the measured activation volumes. However, for the finest grain sizes, annealing results in an increase in the activation volume, suggesting a change in the dominant deformation mechanisms for these structures.

Figure 9

FIG. 8. Scanning electron microscopic images of the residual impressions left after nanoindentation with a cube corner tip into d = 3 nm Ni–W in the (a) as-deposited state, (b) after annealing for 24 h at 150 °C, and (c) after annealing for 24 h at 300 °C. (d) Typical load–displacement curves for as-deposited specimens and after annealing for 24 h at 300 °C. (e) Average strain rate as a function of depth, showing strain bursts for the annealed specimen, which correspond to the discontinuities seen in the indentation response in (d). The shear steps in the pileup become larger and strain bursts are observed after annealing treatments, showing that grain boundary relaxation promotes localized flow in the finest nanocrystalline grain sizes.