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Nanoindentation of high-purity vapor deposited lithium films: A mechanistic rationalization of diffusion-mediated flow

Published online by Cambridge University Press:  25 May 2018

Erik G. Herbert*
Affiliation:
Department of Materials Science and Engineering, Michigan Technological University, Houghton, Michigan 49931, USA
Stephen A. Hackney
Affiliation:
Department of Materials Science and Engineering, Michigan Technological University, Houghton, Michigan 49931, USA
Violet Thole
Affiliation:
Department of Materials Science and Engineering, Michigan Technological University, Houghton, Michigan 49931, USA
Nancy J. Dudney
Affiliation:
Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830, USA
P. Sudharshan Phani
Affiliation:
International Advanced Research Centre for Powder Metallurgy and New Materials, Hyderabad, Telangana–500005, India
*
a)Address all correspondence to this author. e-mail: eherbert@mtu.edu

Abstract

Nanoindentation experiments performed in 5 and 18 μm thick vapor deposited polycrystalline lithium films at 31 °C reveal the mean pressure lithium can support is strongly dependent on length scale and strain rate. At the smallest length scales (indentation depths of 40 nm), the mean pressure lithium can support increases from ∼23 to 175 MPa as the indentation strain rate increases from 0.195 to 1.364 s−1. Furthermore, these pressures are ∼46–350 times higher than the nominal yield strength of bulk polycrystalline lithium. The length scale and strain rate dependent hardness is rationalized using slightly modified forms of the Nabarro–Herring and Harper–Dorn creep mechanisms. Load–displacement curves suggest a stress and length-scale dependent transition from diffusion to dislocation-mediated flow. Collectively, these experimental observations shed significant new light on the mechanical behavior of lithium at the length scale of defects existing at the lithium/solid electrolyte interface.

Information

Type
Invited Feature Paper
Copyright
Copyright © Materials Research Society 2018 
Figure 0

FIG. 1. Load–displacement curves in high-purity vapor deposited polycrystalline Li at 31 °C (TH = 0.67).

Figure 1

FIG. 2. Intermittent contact near the free surface (due to operation of the PLA) and the distinctive transition from relatively smooth to serrated flow.

Figure 2

FIG. 3. High-purity vapor deposited 18 μm thick Li film on a glass substrate. Load–displacement curves at TH = 0.67 and a targeted $\dot{P}{\rm{/}}P$ of 0.05 s−1.

Figure 3

FIG. 4. Load–displacement curves obtained at an indentation strain rate 7 times higher ($\dot{P}$ of 12.5 μN/s) than that achieved under a targeted $\dot{P}{\rm{/}}P$ of 0.05 s−1.

Figure 4

FIG. 5. Indentation strain rate for each of the 4 loading conditions. Curve fits to the pre-burst data are represented by the solid black lines.

Figure 5

FIG. 6. Hardness as a function of depth and a 7× variation in the indentation strain rate. The solid red and blue curve fits show the mean indentation pressure (pre-strain burst) at the highest (red) and lowest (blue) strain rates is directly proportional to h−0.535 and h0.466, respectively.

Figure 6

FIG. 7. Repeatability of the average H as a function of depth and position across the surface of specimen 2–15.

Figure 7

TABLE I. Values of the parameters used to calculate the stress in accordance with Eqs. (15) and (18).

Figure 8

FIG. 8. Direct comparisons between the experimentally measured mean indentation pressure and the stresses predicted by the slightly modified Nabarro–Herring and Harper–Dorn creep relations.

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Appendix A

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Appendix B

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