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A previous radiological assessment of the UK Low Level Waste Repository (LLWR) has considered how the prevailing reducing chemical conditions in disposal trenches, may limit uranium release through the extreme low solubility of U(IV) solids. This study considers the additional effects that the physical and chemical nature of the uranium wastes may have on the release of uranium. Fluoride process residues produced by refining of uranium metal comprise the majority of the legacy inventory. Based on historic records and descriptions of the uranium wastes a conceptual model has been developed which bounds the release rate of uranium present as inclusions and dissolved in the solid residues by the dissolution rate of a magnesium fluoride matrix. The model is represented in a 3-dimensional groundwater flow and geochemical model. Initial findings indicate that the model correctly represents the range of fluoride and uranium concentrations that are measured in leachate from the LLWR trenches. Incorporation of this model in future safety assessments, together with a reduction in the derived inventory of uranium, is likely to result in a significant lowering of the peak groundwater dose to acceptable levels, even in the case that the site re-oxidizes. The study builds confidence in the inherent safety features that are provided by the sparingly soluble uranium waste residues and the reducing chemical conditions of the LLWR trenches.
Since the middle of the 90's, GaN epitaxy techniques have been developed, using either MOCVD or MBE growth methods. A low cost approach is presented aiming at satisfying thermal issues encountered on conventional substrates such as SiC, Sapphire and more recently Silicon. Domain of application are being covered with their associated challenges: RF and High Power applications. Stress engineering is one of the key parameters.
Refractory Metal Intermetallic Composites (RMICs) based on the Nb-Si system are considered as candidates of next-generation high temperature materials (i.e. >1200°C). Ti and Cr have been shown to have beneficial effects on the oxidation resistance and mechanical properties of Nb-Si alloys. Phase equilibria in the Nb-Si-Ti system have been studied in detail. The present study has investigated multiphase equilibria in the Nb-Si-Ti alloys with Cr additions via an approach of integrating thermodynamic modeling with designed experiments. The alloying effects of Cr on the microstructure of the Nb-Si-Ti alloys are described using both phase equilibria and solidification paths that were calculated from the thermodynamic description of the Nb-Cr-Si-Ti system developed in the present study.
Behavior of oxygen, carbon and minority-carrier lifetimes of multi-crystalline silicon (mc-Si) has been investigated by means of FTIR and QSSPCD after three step annealing. For comparison, the annealing of czochralski (CZ) silicon was also carried out under the same conditions. The results revalted that oxygen and carbon concentration pf mc-Si had a larger decrease than that of CZ -Si, which means the more oxygen precipitates in mc-Si were generated. High density defects of mc-Si such as grain boundaries and dislocations accelerated formation of oxygen precipates and defect complex compounds are generated after three step annealing, which could be suction center of defect, that reduced carrier decentralized recombination centers that resulted in improvement of lifetime of wafer. Tendency of difference of lifetime was correlated with interior structure of crystalline silicon.
In as-cast ingots produced by arc-melting, several metastable polytypic modifications of NbCr2 were found additional to the cubic C15 phase stable at room temperature: C14, C36 and 6H-type structures, often highly faulted and/or intergrown. Strikingly, these phases had formed at locations of the specimen which had experienced a relatively low cooling rate, whereas the C15 phase was formed preferentially in regions which had experienced the highest cooling rates.
The fabrication of highly doped and ultra-shallow junctions in silicon is a very challenging problem for the materials scientist. The activation levels which are targeted are well beyond the solubility limit of current dopants in Si and, ideally, they should not diffuse during the activation annealing. In practice, the situation is even worse and when boron is implanted into silicon excess Si interstitial atoms are generated which enhance boron diffusion and favor the formation of Boron-Silicon Interstitials Clusters (BICs). An elegant approach to overcome these difficulties is to enrich the Si layers where boron will be implanted with vacancies before or during the activation annealing. Spectacular results have been recently brought to the community showing both a significant control over dopant diffusion and an increased activation of boron in such layers. In general, the enrichment of the Si layers with vacancies is obtained by Si+ implantation at high energy. We have recently developed an alternative approach in which the vacancies are injected from populations of empty voids undergoing Ostwald ripening during annealing. While different, the effects are also spectacular. The goal of this work is to establish a fair evaluation of these different approaches under technologically relevant conditions. The application domains of both techniques are discussed and future directions for their development/improvement are indicated.
Bentonite plays a significant barrier role in many radioactive waste repository designs, where it has been chosen due to its favourable properties such as plasticity, swelling capacity, colloid filtration, low hydraulic conductivity and its stability in relevant geological environments. However, bentonite is unstable at high pH meaning that it could lose its favourable properties if interacted with hyperalkaline leachates from concrete construction materials (e.g. tunnel liners, grouts, etc.), seals and plugs and/or cementitious wastes in a repository. This fact has forced several national programmes to assess alternative construction and sealing materials such as low alkali cements. Recently, it has been assumed that the lower pH (typically pH 10-11) leachates of such cements will degrade bentonite to a much lesser degree than ‘standard’ OPC-based cement leachates (generally with an initial pH>13).
To date, few laboratory or in situ URL (underground rock laboratory) data are available to support the use of low alkali cements in conjunction with bentonites, partly because of the very slow kinetics involved. Consequently, a new project has focussed on finding an appropriate natural analogue site to provide long-term supporting data which will avoid the kinetic constraints of laboratory and URL experiments. Early results have identified an initial, very promising site at Mangatarem in the Philippines, where a quarry excavating bentonite and zeolites is found in the sedimentary carapace of the Zambales ophiolite. In the immediate vicinity of the quarry, ophiolite-derived hyperalkaline groundwaters are present and further field work (including geophysics surveys and borehole drilling) are now being planned to assess regional bentonite/hyperalkaline groundwater interaction. This paper presents an overview of the current status of the project and assesses the relevance of the study to improving understanding of low-alkali cement leachate/bentonite interaction.
Atomic scale molecular dynamics simulations have been used to predict the location of glass modifying Na, Li and Mg species in a borosilicate Magnox type waste glass adjacent to interfaces with the (100) and (110) surfaces of MgO, CaO and SrO crystals. These simulations show a considerable increase in alkali and alkali earth concentration adjacent to specific interfaces. In particular, there are significant, systematic changes in Na, Li and Mg position and concentration as a function of both the crystal's terminating surface and composition.
An ultrasonic device was designed to fabricate relatively small vacuum chill castings of FeAl-based alloys with improved microstructure. A special hot-rolling procedure preventing thermal shocks was used for the thermomechanical treatment of cast alloys.
The efficiency of ultrasonic vacuum casting is manifested by improved microstructure of hot-rolled iron aluminides Fe – 40 at.% Al with addition of C or Zr and B or Zr and B with 1 wt.% of Y2O3 particles.
The ubiquity of iron oxide minerals and their ability to retain metals on their surface can represent an important retardation factor to the mobility of radionuclides. In a deep repository for the spent nuclear fuel, the intrusion of the groundwater might produce the anoxic corrosion of the iron, with magnetite as one of the end-products. In this study, as expected considering the strontium speciation in solution, strontium is sorbed onto magnetite at alkaline pH values while at acidic pH the sorption is negligible. Magnetite is able to sorb more than the 50% of the strontium from a 8·10-6 mol·dm-3 solution at the pH range representative of most groundwater (7-9). A surface complexation model has been applied to the experimental data, allowing to explain the results using the Diffuse Layer Model (DLM) and considering the formation of the inner-sphere complex >FeOHSr2+ (with a calculated logK=2.7±0.3). Considering these data, the magnetite capacity to retain strontium and other radionuclides is discussed
By means of two-point-probe Spreading Resistance (SR) analyses, the formation and evolution of hydrogen-related and vacancy-related donor and acceptor states were studied in helium implanted and subsequently hydrogen plasma-treated n-type Float-Zone (FZ) silicon wafers. He-implantation was carried out at 3.75 MeV, applying fluences of 1×1014 cm-2 and 2×1013 cm-2. After 15-min post-implantation H-plasma exposures at substrate temperatures between 350 °C and 500 °C, distinct surplus doping profiles were observed in the subsurface layers of the treated FZ Si samples down to about 20 μm depth. Enhanced donor concentrations could be observed as well acceptor-like states, at least partially compensating for the initial n-type doping, so that even buried p-type layers can be created under appropriate process conditions. The nature of the defect complexes that were responsible for the observed doping profiles in the subsurface layer of the studied samples will be discussed.
TNM™ alloys are novel γ-TiAl based alloys which exhibit a high concentration of β-stabilizing elements such as Nb and Mo. Due to the high volume fraction of disordered β-phase these alloys can be hot-die forged under near conventional conditions. In this study, solid-state phase transformations and phase transition temperatures in Ti-(41-45)Al-4Nb-1Mo-0.1B (in at%) alloys were analyzed experimentally and compared to thermodynamic calculations. Results from scanning electron microscopy, conventional and high-energy X-ray diffraction as well as differential scanning calorimetry were used for the characterization of the prevailing phases and phase transformations. For the prediction of phase stabilities and phase transition temperatures thermodynamic calculations were conducted. ThermoCalc® was applied using a commercially available TiAl database. Combining all results a stable as well as a metastable phase diagram for Ti-(41-45)Al-4Nb-1Mo-0.1B alloys is proposed.
Thin film solar cells based on polycrystalline silicon are an appealing option combining the advantages of thin film technologies, namely low cost, and the superior electrical properties of crystalline silicon. The specific structure aimed at in this work uses the relatively simple contacting scheme used in amorphous silicon thin film solar cells which relies on a front contact consisting of a transparent conducting oxide (TCO). Electron beam evaporation is applied as preparation method for the silicon films with high deposition rate. Solid phase crystallization (SPC) is used to crystallize the silicon films after deposition.
In this work the properties of as-deposited and crystallized silicon films produced by e beam evaporation are investigated as a function of deposition temperature. It is shown that the largest crystallites are obtained for deposition around 300 °C and subsequent treatment at 600 °C, while deposition at higher temperatures leads to small crystal grains which are not changed significantly during SPC.
Solar cells have been prepared on TCO-coated glass and were studied by measurements of the external quantum efficiency.
The electronic structure of the actinide metals, Th, U, Np, Pu, Am, and Cm, is investigated using electron energy-loss spectroscopy (EELS) in a transmission electron microscope, together with many-electron spectral calculations. At the N4,5 edge, sum rule analysis gives the angular part of the spin-orbit interaction per hole, showing that while light metals (Th and U) follow LS coupling, heavier metals (Pu, Am, and Cm) follow intermediate coupling of the 5f states. The intermediate coupling is near the jj limit for Pu and Am, but strongly shifted towards the LS coupling limit for Cm. At the O4,5 edge many-electron spectral calculations show that the prepeak corresponds to a “forbidden” transition.
The change of the visible light ellipsometric parameters and mechanical harmonic frequencies of a hydrophobic gold surface attached to a quartz crystal are measured in aqueous solution during deposition of synperonic polymer thin film. The ellipsometry data reveal the amount of polymer mass attached to the surface, while the mechanical resonance shifts are caused by the total mass attached to the surface. Analysis of the combined ellipsometry and quartz crystal microbalance data reveal that the polymer thin film has a high water content, and we determine in-situ, for the first time, the porosity, or the water content, of a polymer thin film in aqueous solution.
Three kinds of Mo-Si-B ternary alloys and a 1 at.% Al added Mo-Si-B alloy with the compositions near Mo-8.7 at.% Si-17.4 at.% B that is in the Mo5SiB2 and Mo two-phase compositional region were produced by Ar arc-melting followed by the heat treatment at 1800 °C for 24 h. These alloys have the characteristic fine microstructure composed of small Mo solid solution (Moss) particles in the Mo5SiB2 (T2) matrix with the primary phase (Moss or T2 depending on composition). The volume fraction of the Moss particles ranges from 25.5 to 30.5 % and its average size from 3.0 to 6.4 μm in the fine microstructure of the alloys. Micro cracks were introduced by Vickers hardness tests into the microstructures, and their propagation is disturbed by the small Moss particles. Thus, each hardness value seems to relate to the cracking behavior around each indent. On the other hand, Vickers hardness values do not show correlation with the volume fraction of the Moss particles, but clearly decrease with increasing the average particle size of Moss. Therefore, it should be concluded that the increase in the particle size of Moss could enhance the toughness of the Mo5SiB2/Mo-based alloys effectively by ductile phase toughening.
In this paper, we present results of epitaxial layer deposition for production needs using our hot-wall CVD multi-wafer system VP2000HW from Epigress with a capability of processing 6×100mm wafers per run. Intra-wafer and wafer-to-wafer homogeneities of doping and thickness for full-loaded 6×100mm runs will be shown and compared to results of the former 7×3″ setup. The characteristic of the run-to-run reproducibility for the 6×100mm setup will be discussed. To demonstrate the suitability of the reactor for device production results on Schottky Barrier Diodes (SBD) processed in the multi-wafer system will be given. Furthermore, we show results for n- and p-type SiC homoepitaxial growth on 3″, 4° off-oriented substrates using a single-wafer hot-wall reactor VP508GFR from Epigress for the development of PiN-diodes with blocking voltages above 6.5 kV. Characteristics of n- and p-type epilayers and doping memory effects are discussed. 6.5 kV PiN-diodes were fabricated and electrically characterized. Results on reverse blocking behaviour, forward characteristics and drift stability will be presented.
The influence of growth temperature on oxygen incorporation into GaN epitaxial layers was studied. GaN layers deposited at low temperatures were characterized by much higher oxygen concentration than those deposited at high temperature typically used for epitaxial growth. GaN buffer layers (HT GaN) about 1 μm thick were deposited on GaN nucleation layers (NL) with various thicknesses. The influence of NL thickness on crystalline quality and oxygen concentration of HT GaN layers were studied using RBS and SIMS. With increasing thickness of NL the crystalline quality of GaN buffer layers deteriorates and the oxygen concentration increases. It was observed that oxygen atoms incorporated at low temperature in NL diffuse into GaN buffer layer during high temperature growth as a consequence GaN NL is the source for unintentional oxygen doping.
In this study we investigated the deformation behavior of the hexagonal ordered phase α2- Ti3Al in Duplex TiAl under tensile loading. Transmission electron microscopy (TEM) revealed that the orientation relation ships (OR) between α2-Ti3Al and the L10 ordered γ- TiAl phase are very different as compared to the OR common in fully lamellar PST TiAl. We observed deformation related <2c+a> dislocation activity on pyramidal slip systems in the α2-phase during post situ TEM analyses. We rationalize this observation by the possible build up of pile up stresses in γ-TiAl due to the different OR with the α2-Ti3Al phase that can possibly lead to the activation of <2c+a> dislocation activity on pyramidal slip systems with similarly resolved stresses in the α2-Ti3Al phase.