To save content items to your account,
please confirm that you agree to abide by our usage policies.
If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your account.
Find out more about saving content to .
To save content items to your Kindle, first ensure no-reply@cambridge.org
is added to your Approved Personal Document E-mail List under your Personal Document Settings
on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part
of your Kindle email address below.
Find out more about saving to your Kindle.
Note you can select to save to either the @free.kindle.com or @kindle.com variations.
‘@free.kindle.com’ emails are free but can only be saved to your device when it is connected to wi-fi.
‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.
A common characteristic in semiconductor nanostructures is the lattice strain originating from the lattice mismatch between layers of different compositions. Three-dimensional strain measurement in crystals using transmission electron microscopy (TEM) techniques has been the subject of intense works for decades. This information is required for the strain-bandgap engineering being used by our current fast computers and necessary for future quantum computers. However, the missing information was the 3rd dimension that is the atomic displacement and how it changes along the electron-beam direction. The strain information along the electron-beam direction is in the phase of the diffracted beam, which has been obtained recently by the novel technique of self-interference of split higher order Laue zone line (SIS-HOLZ). SIS-HOLZ has been made possible by the correction of the beam aberrations having its analytical and experimental details reported here for the atomic displacement profile existing at the interface of a Si and Si/Si0.8Ge0.2 superlattice.
Hydrogenated amorphous carbon (a-C:H) films with a designed buffer layer of amorphous hydrogenated silicon carbide on the substrates were fabricated by plasma enhanced chemical vapor deposition (PECVD). The effect of radio frequency (RF) power on the structural and optical properties of a-C:H films was investigated. The ratios of sp3 to sp2 of carbon atoms and hydrogen contents in the RF power range of 75–175 W are determined and a similar trend as a function of power. The increase of sp3 to sp2 ratio leads to the increase of transmittance and optical gap of a-C:H films. a-C:H film under an RF power of 175 W possesses high transmissive ability (>80%) in the visible wave length, even the highest transmittance value of about 94.2% is achieved at the wave length 550 nm. These results show the optimal a-C:H films which are promising for the applications in the area of solar cells acting a window layer and antireflection layer.