The effects of the main parameters of the helicon plasma sources on the volume process of the negative ion production mechanism are investigated. Using COMSOL Multi-Physics software, a helicon plasma source as a source driver of a negative ion source is modelled in three dimensions. In this work, it is considered that the helicon plasma source employs a Nagoya-type antenna at an operational frequency of 13.56 MHz. The influences of the static magnetic field variation, applied radio frequency power and injected gas pressure on electron/plasma density, electron temperature and vibrationally excited molecular density are studied. Variations of the static magnetic field in a range of 0.01–0.08 T, Radio Frequency (RF) power in a range of 800–6000 W and gas pressure range of 0.3–1.5 Pa indicate that the maximum electron (plasma) density is increased in all three cases; nevertheless, the electron temperature and maximum density of the vibrationally excited molecules is increased just by RF power increment. For the pressure of 0.3 Pa, it is found that using a proper coil configuration, the electron density and the vibrationally excited molecular density will be increased without the magnetic field (applied DC power) increment and RF power increment.